N-(tert-butylamino)(chloromethyl)dimethylsilane

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 英文名称: N-(tert-butylamino)(chloromethyl)dimethylsilane
• 英文别名: t-butylamino(chloromethyl)dimethylsilane；N-[chloromethyl(dimethyl)silyl]-2-methylpropan-2-amine
• 化学式: C₇H₁₈ClNSi
• 分子量: 179.765
• InChiKey: UCCZVFMGDAROGT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.36
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  二甲胺 、 N-(tert-butylamino)(chloromethyl)dimethylsilane 在 正丁基锂 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 20.5h， 以29%的产率得到N-(tert-butylamino)-(N'-(dimethylamino)methyl)dimethylsilane
  参考文献：
  名称：

  シリルジアミン化合物及びこれを配位子に有する有機金属化合物

  摘要：

  The problem of the present invention is to provide a novel organometallic compound that can be used for film formation by CVD or ALD methods. The problem of the present invention is solved by the novel organic metal compound having a silyldiamine compound of the present invention as a ligand, and a thin film forming material containing this organic metal compound. In other words, the novel organic metal compound having a silyldiamine compound of the present invention as a ligand is volatile and can be suitably used as a semiconductor film forming material.【Selected drawing】None.

  公开号：

  JP2017222612A
• 作为产物：
  描述：

  氯甲基二甲基氯硅烷 、 叔丁胺 在 三乙胺 作用下， 以 正己烷 为溶剂， 反应 48.0h， 以54%的产率得到N-(tert-butylamino)(chloromethyl)dimethylsilane
  参考文献：
  名称：

  シリルジアミン化合物及びこれを配位子に有する有機金属化合物

  摘要：

  The problem of the present invention is to provide a novel organometallic compound that can be used for film formation by CVD or ALD methods. The problem of the present invention is solved by the novel organic metal compound having a silyldiamine compound of the present invention as a ligand, and a thin film forming material containing this organic metal compound. In other words, the novel organic metal compound having a silyldiamine compound of the present invention as a ligand is volatile and can be suitably used as a semiconductor film forming material.【Selected drawing】None.

  公开号：

  JP2017222612A

文献信息

• Preparation of group 4 metal complexes of a bulky amido-fluorenyl ligand
  作者：H.V. Rasika Dias、Ziyun Wang、Simon G. Bott

  DOI：10.1016/0022-328x(95)05803-w

  日期：1996.2

  spectroscopic and structural characterization of new amido-fluorenyl ligand [Me3CN(H)Si(Me)2CH2C3H8}Li(THF)] (1) is reported. The treatment of 1 with BuLi followed by the reaction with Group 4 metal chlorides led to crystalline, solvent free, metal complexes [(η1−NCME3)Si(Me)2CH2(η5−C13H8)}MCl2] () in good yield. The X-ray crystal structures of 4 and 5 are also reported. Both these compounds possess monomeric

  合成，新的酰氨基-芴基配体的光谱和结构表征[我3 CN（H）Si（ME）2 CH 2 C 3 ħ 8 }的Li（THF）]（1被报告）。治疗1用BuLi接着用[（导致结晶4族金属氯化物，不含溶剂，金属配合物反应η 1 -NCME 3）的Si（Me）的2 CH 2（η 5 -C 13 ħ 8）} MCl 2 ]（），收率高。4和5的X射线晶体结构也有报道。这两种化合物都具有带有相对短的MN和MCl键的单体结构。4和5的MN距离分别为2.060（3）Å和2.065（3）Å。金属离子配位到芴基在η 5 -时尚。X射线数据还表明在这些金属络合物中存在相对未应变的配体主链。
• PREPARATION OF METAL COORDINATION COMPLEX
  申请人：THE DOW CHEMICAL COMPANY

  公开号：EP0563365B1

  公开（公告）日：1997-11-05
• シリルジアミン化合物及びこれを配位子に有する有機金属化合物
  申请人：宇部興産株式会社

  公开号：JP2017222612A

  公开（公告）日：2017-12-21

  【課題】本発明の課題は、主にＣＶＤ法やＡＬＤ法による成膜に使用できる新規な有機金属化合物を提供することにある。【解決手段】本発明の課題は、本発明のシリルジアミン化合物及びこれを配位子に有する新規な有機金属化合物並びにこの有機金属化合物を含有する薄膜形成用材料により解決される。すなわち、本発明のシリルジアミン化合物を配位子に有する新規な有機金属化合物は揮発性を有し、半導体成膜材料として好適に使用することができる。【選択図】なし

  The problem of the present invention is to provide a novel organometallic compound that can be used for film formation by CVD or ALD methods. The problem of the present invention is solved by the novel organic metal compound having a silyldiamine compound of the present invention as a ligand, and a thin film forming material containing this organic metal compound. In other words, the novel organic metal compound having a silyldiamine compound of the present invention as a ligand is volatile and can be suitably used as a semiconductor film forming material.【Selected drawing】None.