A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided:
wherein X represents an electron donor group; R
1
and R
2
each independently represent an alkyl group or the like; R
4
to R
6
each independently represent an alkyl group, or the like; R
3
represents a cyclic alkenediyl group or the like; and −A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.
提供以下式(1)所表示的
磺化物化合物,含有该
磺化物化合物的光酸发生剂,以及含有该光酸发生剂的抗蚀组合物:其中X代表一个电子给体基团;R1和R2各自独立地代表一个烷基基团或类似物;R4至R6各自独立地代表一个烷基基团或类似物;R3代表一个环烯二基基团或类似物;以及−A代表一个阴离子。该
磺化物化合物具有通过在一个分子的阳离子区引入不同吸收剂来控制的光子产量,可解决当该
磺化物化合物被应用为光酸发生剂时使用不同光酸发生剂混合物的不便,具有在抗蚀剂中优异的溶解性,并具有增强的分辨率和线边粗糙度。