hexamethyldisiloxane has been photolyzed at 15°C with a low pressure Hg arc (affective wavelength 185 nm). 19 products have been identified and their quantum yields determined. The quantum yields of the three main products are φ[CH4] = 0.20, φ[C2H6] = 0.045, and φ[(Me3SiOSiMe2)2] = 0.042. The main event in this photolysis is the rupture of a SiC bond, following the homolytic (i) as well as the molecular mode
液态六甲基二
硅氧烷已在15°C的低压Hg电弧(有效波长185 nm)下光解。已鉴定出19种产品,并确定了其量子产率。三个主要产物的量子产率是φ[CH 4 ] = 0.20,φ[C 2 H ^ 6 ] = 0.045,和φ[(ME 3 SiOSiMe 2)2 ] = 0.042。这种光解的主要事件是在均相(i)和分子模式(ii)之后Si aC键的断裂。进程iii发生的程度较小,但根本找不到iv。在这些实验中,笼子歧化反应无法与分子消除区分开。非常反应性中间体物质我3 SiOSi(Me)中
CH2与自由基相互作用,与极性化合物(例如
甲醇)相互作用,并彼此相互作用,形成稳定的化合物。它出现在我3 SiOSi(Me)中CH 2也形成在歧化反应(VI)。