申请人:Jing Naiyong
公开号:US20050092429A1
公开(公告)日:2005-05-05
Fluoropolymeric substrates are modified by a photochemical process that includes at least one species having the formula
wherein: R represents hydrogen or an alkyl or cycloalkyl group having from 1 to 18 carbon atoms or an aryl, alkaryl, or aralkyl group having from 6 to 18 carbon atoms; X represents O or NH; and each of R
1
, R
2
, R
3
, and R
4
independently represents H, an alkyl group having from 1 to 18 carbon atoms, an alkenyl group having from 1 to 18 carbon atoms, an aryl group having from 6 to 10 carbon atoms, or any two of R, R
1
, R
2
, R
3
, and R
4
taken together represent an alkylene group having from 2 to 6 carbon atoms, with the proviso that at least one of R
1
and R
2
or at least one of R
3
and R
4
is not H.
通过光化学工艺对含氟聚合物基底进行改性,该工艺包括至少一种具有以下式子的物质
其中R 代表氢或具有 1 至 18 个碳原子的烷基或环烷基,或具有 6 至 18 个碳原子的芳基、烷芳基或芳烷基; X 代表 O 或 NH;以及每个 R
1
, R
2
, R
3
和 R
4
独立地代表 H、具有 1 至 18 个碳原子的烷基、具有 1 至 18 个碳原子的烯基、具有 6 至 10 个碳原子的芳基,或 R、R 1、R 3 和 R 4 中的任意两个。
1
, R
2
, R
3
和 R
4
共同代表一个具有 2 至 6 个碳原子的亚烷基,但其中至少有一个 R
1
和 R
2
或 R
3
和 R
4
不是 H。