A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
本发明公开了一种形成图案的方法。该方法包括制备一种组合物,该组合物包括溶剂和聚合物,聚合物包括重复单元,其中至少一个具有第一结构的异
氰脲酸酯单元与另一个具有不同于第一结构的第二结构的异
氰脲酸酯单元相连接;将组合物涂在基底上以形成底层;在底层上形成光刻胶层;蚀刻光刻胶层以形成光刻胶图案;以及使用光刻胶图案对基底进行图案化。