申请人:Morton Thiokol, Inc.
公开号:US04734514A1
公开(公告)日:1988-03-29
Organometallic compounds having the formulas: ##STR1## wherein N is selected from phosphorus and arsenic, H is hydride, and X and Y are independently selected from hydride, lower alkyl cyclopentadienyl, and phenyl, except that Y cannot be hydrogen; and MR.sub.x wherein x is an integer from 2 to 4 inclusive, each said R substituent is independently selected from hydride, lower alkyl, phenyl, alkyl-substituted phenyl, cyclopentadienyl, and alkyl-substituted cyclopentadienyl, and M is selected from elements of Groups 2B, 2A, 3A, 5A, and 6A of the Periodic Table, except carbon, nitrogen, oxygen, and sulfur. The use of these compounds in chemical vapor deposition processes and methods for synthesizing these compounds are also disclosed.
含有以下化学式的有机金属化合物:##STR1## 其中N从磷和砷中选择,H是氢化物,X和Y分别从氢化物、较低烷基环戊二烯基和苯基中选择,但Y不能是氢;以及MR.sub.x,其中x是从2到4的整数,每个R取代基分别从氢化物、较低烷基、苯基、烷基取代苯基、环戊二烯基和烷基取代环戊二烯基中选择,M从元素2B、2A、3A、5A和6A组中选择,除了碳、氮、氧和硫。还公开了这些化合物在化学气相沉积过程中的使用以及合成这些化合物的方法。