2-萘基乙基甲基丙烯酸酯 | 71154-41-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: 2-萘基乙基甲基丙烯酸酯
• 英文名称: 2-Naphthylethyl methacrylate
• 英文别名: 2-naphthalen-2-ylethyl 2-methylprop-2-enoate
• CAS: 71154-41-1
• 化学式: C₁₆H₁₆O₂
• 分子量: 240.3
• InChiKey: UGRAJKVJLIUYIH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  18
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.19
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Substituted imidazoles and their use as pesticides
  申请人：Pfizer Limited

  公开号：EP2423199A1

  公开（公告）日：2012-02-29

  This invention relates to a range of alpha substituted 2-benzyl substituted imidazole compounds and pharmaceutically acceptable salts and solvates thereof, to compositions comprising such compounds, processes for their synthesis and their use as parasiticides.

  本发明涉及一系列α-取代的 2-苄基取代咪唑化合物及其药学上可接受的盐和溶液，涉及包含此类化合物的组合物、其合成工艺及其作为杀寄生虫剂的用途。
• Method for producing polymer
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10191373B2

  公开（公告）日：2019-01-29

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.

  通过在含有氮原子的不可聚合化合物溶液中聚合相应的单体，可获得一种聚合物，该化合物含有与骨架结合的酸发生器的递归单元，以及具有可选的酸标签基取代的羧基的递归单元和/或具有可选的酸标签基取代的羟基的递归单元。这样可以防止在正性抗蚀剂形成聚合物中发生酸标签基的脱保护反应，或在负性抗蚀剂形成聚合物中发生交联反应。
• Polymer, resist composition, and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10457761B2

  公开（公告）日：2019-10-29

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to 0.05 mW/cm2. The polymer avoids photo-decomposition of the acid generator during polymerization and concomitant deprotection reaction of the acid labile group when used in positive resist compositions. A pattern with high dissolution contrast and rectangularity is formed after development.

  在波长不超过 400 纳米的光照下，使相应的单体聚合，使光照量不超过 0.05 mW/cm2，可获得一种聚合物，该聚合物包含与骨架结合有酸发生器的递归单元，以及具有可选的酸标签基取代的羧基和/或具有可选的酸标签基取代的羟基的递归单元。这种聚合物在聚合过程中可避免酸发生器的光分解，以及在正抗蚀剂组合物中使用时可避免随之而来的酸性基团的脱保护反应。显影后形成的图案具有较高的溶解对比度和矩形度。
• SILICONE CONTACT LENSES WITH WRINKLED SURFACE
  申请人：Bausch & Lomb Incorporated

  公开号：EP2092375B1

  公开（公告）日：2011-12-21
• METHOD FOR PRODUCING POLYMER
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170097567A1

  公开（公告）日：2017-04-06

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.