trimethylenebis(3-methylurea) | 78152-52-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机碳酸及其衍生物
• 英文名称: trimethylenebis(3-methylurea)
• 英文别名: N,N'-Bis-methylcarbamoyl-trimethylendiamin；1-Methyl-3-[3-(methylcarbamoylamino)propyl]urea
• CAS: 78152-52-0
• 化学式: C₇H₁₆N₄O₂
• 分子量: 188.23
• InChiKey: FBXRDULUPPMRBE-UHFFFAOYSA-N

物化性质

• 沸点：
  500.1±33.0 °C(Predicted)
• 密度：
  1.084±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -1.1
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  82.3
• 氢给体数：
  4
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  trimethylenebis(3-methylurea) 在 溶剂黄146 、 sodium nitrite 作用下， 生成 N,N''-1,3-propanediylbis(N'-methyl-N'-nitroso-urea)
  参考文献：
  名称：

  抗肿瘤剂的合成。XXXII。N-硝基 一世。

  摘要：

  DOI：

  10.1021/jm00342a010
• 作为产物：
  描述：

  1,3-丙二胺 、 异氰酸甲酯 以 乙醚 为溶剂， 生成 trimethylenebis(3-methylurea)
  参考文献：
  名称：

  抗肿瘤剂的合成。XXXII。N-硝基 一世。

  摘要：

  DOI：

  10.1021/jm00342a010

文献信息

• Bis(dihydroxymethyloxoimidazolidinyl)alkanes
  申请人：The United States of America as represented by the Secretary of

  公开号：US04298747A1

  公开（公告）日：1981-11-03

  New compounds in the class of .alpha.,.omega.-bis(4,5-dihydroxy-3-methyl-2-oxoimidazolidin-1-yl)alkanes have been prepared from the reaction of glyoxal and an alkylenebis(3-methylurea). These compounds are useful as formaldehyde-free finishing agents for textiles containing cellulose.

  已从甘醇和烷基双(3-甲基脲)的反应中制备了一类新的.alpha.，.omega.-双(4,5-二羟基-3-甲基-2-氧代咪唑啉-1-基)烷化合物。这些化合物可用作含有纤维素的纺织品的无甲醛整理剂。
• CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME
  申请人：NISHIWAKI Yoshinori

  公开号：US20090088361A1

  公开（公告）日：2009-04-02

  The present invention provides a cleaning agent for cleaning a semiconductor device having copper wiring on the surface thereof following a chemical mechanical polishing process in a production process of a semiconductor device, including a compound represented by the following formula (I): X 1 -L—X 2 formula (I) wherein, in formula (I), X 1 and X 2 each independently represent a monovalent substituent formed by removing one hydrogen atom from a heterocycle containing at least one nitrogen atom, and L represents a divalent linking group; and provides a cleaning method using the cleaning agent.
• POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME
  申请人：TOMIGA Takamitsu

  公开号：US20090239380A1

  公开（公告）日：2009-09-24

  A liquid for polishing a metal is provided that is used for chemically and mechanically polishing a conductor film including copper or a copper alloy in production of a semiconductor device, and a polishing method using the metal-polishing liquid is also provided. The liquid includes: (a) colloidal silica particles having an average primary particle size of from 10 nm to 25 nm and an average secondary particle size of from 50 nm to 70 nm; (b) a metal anticorrosive agent; (c) at least one compound selected from the group consisting of a surfactant and a water-soluble polymer compound; (d) an oxidizing agent; and (e) an organic acid.
• Metal polishing slurry and chemical mechanical polishing method
  申请人：Yoshikawa Masaru

  公开号：US20100075500A1

  公开（公告）日：2010-03-25

  The invention provides a metal polishing slurry containing a compound represented by the general formula (1): (X 1 ) n -L wherein X 1 represents a heterocycle containing at least one nitrogen atom, n represents an integer of 2 or more, and L represents a linking group having a valence of 2 or more, provided that X 1 s whose number is n may be the same or different, an oxidizer and an organic acid; and a method of chemical mechanical polishing using such slurry. The metal polishing slurry and the chemical mechanical polishing method are used in chemical mechanical polishing in the step of manufacturing semiconductor devices and enable a high polishing rate to be achieved while causing minimal dishing in polishing an object (wafer).
• PHENYL TETRAHYDROISOQUINOLINE COMPOUND SUBSTITUTED WITH HETEROARYL
  申请人：TAISHO PHARMACEUTICAL CO., LTD

  公开号：US20170210736A1

  公开（公告）日：2017-07-27

  The present invention provides a compound represented by the following formula [1] or a pharmaceutically acceptable salt thereof which has an excellent NHE3 inhibitory effect: [Formula 15] A-Y  [1] wherein A represents a structure represented by the following formula [2]: wherein R 11 and R 12 each represent a halogen atom or the like, R 2 represents C 1-6 alkyl or the like, ring E represents triazole, tetrazole, pyrimidine, or the like, R 31 and R 32 each represent a hydrogen atom, C 1-6 alkyl, C 1-6 alkoxy, or the like, and W represents a single bond, the formula —NH—, the formula —O—, or the formula —CONH—, and Y represents a hydrogen atom or a structure represented by the following formula [3′]: