申请人:Nobe Youhei
公开号:US20110082309A1
公开(公告)日:2011-04-07
A simple method of producing an organosilicon compound of a formula R
2
n
(OR
4
)
m
Si—R
1
—Si(OR
4
)
m
R
2
n
is disclosed. The method comprises the following two steps,
Y—R
1
—Y+SiX
m+1
R
2
n
->R
2
n
X
m
Si—R
1
—SiX
m
R
2
n
R
2
n
X
m
Si—R
1
—SiX
m
R
2
n
+M(OR
4
)
r
,->R
2
n
(OR
4
)
m
Si—R
1
—Si(OR
4
)
m
R
2
n
In the formulas, R
1
is methylene, alkylene, or arylene, R
2
is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R
4
is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.
一种简单的制备有机硅化合物的方法,其化学式为R2n(OR4)mSi—R1—Si(OR4)mR2n被揭示。该方法包括以下两个步骤,Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2nR2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n在上述化学式中,R1是亚甲基、烷基或芳基,R2是烷基、烯基、炔基或芳基,m和n为0至3,满足m+n=3,至少一个m为1或更多,Y是卤素,X是氢或卤素,R4是烷基、烯基、炔基或芳基,M是金属,r是金属的化合价)。这种有机硅化合物用于形成具有出色的耐热性、耐化学性、导电性和弹性模量的薄膜。