申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160077431A1
公开(公告)日:2016-03-17
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator:
wherein R
3
represents a hydrogen atom or a methyl group, R
4
represents a C
1
to C
24
saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R
1
represents a hydrogen atom or a methyl group, and L
1
represents a single bond or a C
1
to C
18
divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R
2
represents a C
3
to C
18
alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C
1
to C
8
aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L
1
has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.