2-hydroxy-4,8-dioxa-5-thiatricyclo[4.2.1.0(3,7)]nonane 5,5-dioxide | 936020-53-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧硫杂环戊烷
• 英文名称: 2-hydroxy-4,8-dioxa-5-thiatricyclo[4.2.1.0(3,7)]nonane 5,5-dioxide
• 英文别名: 5-Hydroxy-7-oxanorbornane-2,6-sultone；5,5-dioxo-4,8-dioxa-5λ6-thiatricyclo[4.2.1.03,7]nonan-2-ol
• CAS: 936020-53-0
• 化学式: C₆H₈O₅S
• 分子量: 192.193
• InChiKey: HRXXRCJBTLVTET-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.2
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  81.2
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  3,3'-二氢氧啉酸 、 2-hydroxy-4,8-dioxa-5-thiatricyclo[4.2.1.0(3,7)]nonane 5,5-dioxide 在 4-二甲氨基吡啶 作用下， 以 二氯甲烷 为溶剂， 反应 10.0h， 以24.1 g的产率得到(5,5-Dioxo-4,8-dioxa-5lambda6-thiatricyclo[4.2.1.03,7]nonan-2-yl) 3-[[3-[(5,5-dioxo-4,8-dioxa-5lambda6-thiatricyclo[4.2.1.03,7]nonan-2-yl)oxy]-3-oxopropyl]disulfanyl]propanoate
  参考文献：
  名称：

  TW2020/12366

  摘要：

  公开号：
• 作为产物：
  描述：

  sodium 7-oxa-5-norbornene-2-sulfonate 在 甲酸 、 双氧水 作用下， 以 水 为溶剂， 反应 43.0h， 生成 2-hydroxy-4,8-dioxa-5-thiatricyclo[4.2.1.0(3,7)]nonane 5,5-dioxide
  参考文献：
  名称：

  PRODUCTION METHOD FOR SULTONE DERIVATIVES

  摘要：

  提供了一种可以在工业上以高纯度生产2-羟基-4-氧杂-5-硫杂三环[4.2.1.0 3,7 ]壬烷5,5-二氧化物衍生物的方法，该方法是从高纯度且工业上可获得的原料中以高产率获得的。 本发明中硫酸酯衍生物的生产方法包括以下步骤（A）：通过水解以下化学式1所示的磺酰卤化物衍生物或其对应体，获得磺酸衍生物： 以及步骤（B）：通过用氧化剂处理磺酸衍生物，获得相应的硫酸酯衍生物，如下化学式2所示或其对应体。

  公开号：

  US20110160465A1

文献信息

• Production method for sultone derivatives
  申请人：Nakayama Osamu

  公开号：US08367849B2

  公开（公告）日：2013-02-05

  There is provided a means to produce industrially a highly pure 2-hydroxy-4-oxa-5-thiatricyclo[4.2.1.03,7]nonane 5,5-dioxide derivative in high yield from highly pure and industrially available raw materials. The production method for a sultone derivative of the present invention comprises a step (A) to obtain a sulfonic acid derivative by hydrolyzing a sulfonyl halide derivative represented by the following chemical formula 1: or an enantiomer thereof and a step (B) to obtain a corresponding sultone derivative represented by the following chemical formula 2: or an enantiomer thereof by treating the sulfonic acid derivative with a oxidizing agent.

  提供了一种从高纯度和工业上可获得的原材料中高产生产高纯度2-羟基-4-氧杂-5-硫代三环[4.2.1.03,7]非烷5,5-二氧化物衍生物的手段。本发明的磺酸酯衍生物的生产方法包括以下步骤：(A)通过水解以下化学式1所表示的磺酰卤代衍生物或其对映体来获得磺酸衍生物；(B)通过使用氧化剂处理磺酸衍生物来获得以下化学式2所表示的相应的磺酸内酯衍生物或其对映体。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20130260312A1

  公开（公告）日：2013-10-03

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including a base component that exhibits changed solubility in a developing solution under the action of acid, the base component containing a resin component having a structural unit represented by general formula (a0-1) shown below: in which R 1 represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, R 2 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and X represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.

  一种抗蚀组合物，暴露后产生酸并在酸的作用下在显影溶液中表现出改变的溶解度，该抗蚀组合物包括一种在酸的作用下在显影溶液中表现出改变的溶解度的碱性组分，该碱性组分包含具有下式（a0-1）所表示的结构单元的树脂组分：其中R1表示氢原子或1至5个碳原子的烷基；R2表示氢原子、1至5个碳原子的烷基或1至5个碳原子的卤代烷基；X表示氧原子、硫原子或1至5个碳原子的含氧原子或硫原子的亚烷基。
• ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION
  申请人：Nakayama Osamu

  公开号：US20130164675A1

  公开（公告）日：2013-06-27

  The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R 2 , R 3 , R 5 , R 7 , R 8 , and R 10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R 4 and R 6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R 4 and R 6 are linked together to form an alkylene group, —O—, or —S—; R 9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR 11 ; R 11 represents an alkyl group; X represents —O— or >N—R 12 ; R 12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O) n ; n is an integer of 0 to 2; and the wavy lines represent that either R 8 or R 9 may be in an endo or exo position.

  本发明提供了一种新型的丙烯酸酯衍生物，可形成聚合物的结构单元，用于纳入到光刻胶组合物中；一种通过含有丙烯酸酯衍生物的原料聚合而成的聚合物；以及一种包含该聚合物的光刻胶组合物，与传统光刻胶相比，实现了形成具有改善LWR的高分辨率抗蚀图案。具体而言，本发明提供了例如下式（1）所表示的丙烯酸酯衍生物：其中，R1表示氢原子，甲基或三氟甲基；R2、R3、R5、R7、R8和R10中的每一个表示氢原子，烷基，环烷基或烷氧基；R4和R6中的每一个表示氢原子，烷基，环烷基或烷氧基，或者R4和R6连接在一起形成烷基，-O-或-S-；R9表示氢原子，烷基，环烷基，烷氧基或-COOR11；R11表示烷基；X表示-O-或>N-R12；R12表示氢原子或烷基；Y表示>C═O或>S(═O)n；n为0到2的整数；波浪线表示R8或R9中的任意一个可以处于内部或外部位置。
• ACRYLAMIDE DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
  申请人：Aratani Ichihiro

  公开号：US20130230802A1

  公开（公告）日：2013-09-05

  To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R 2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): wherein X represents an oxygen atom or >N—R 3 ; R 3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C═O or >S(═O) n ; and n is an integer of 0 to 2.

  为提供一种可以形成聚合物结构单元的丙烯酰胺衍生物，该聚合物可纳入到光刻胶组合物中，通过含有该丙烯酰胺衍生物的原料的聚合制备的聚合物以及包含该聚合物的光刻胶组合物，与传统情况相比，实现了形成具有改善LWR的高分辨率光刻胶图案。该发明提供了由以下公式（1）表示的丙烯酰胺衍生物：其中R1代表氢原子、甲基或三氟甲基；W代表C1到C10的烷基或C3到C10的环烷基；R2代表具有3到20个环形成原子的环状基团，由以下公式（2）表示：其中X代表氧原子或>N—R3；R3代表氢原子或C1到C5的烷基；Y代表>C═O或>S(═O)n；n为0到2的整数。
• Acrylic ester derivative, high-molecular compound and photoresist composition
  申请人：Nakayama Osamu

  公开号：US09152042B2

  公开（公告）日：2015-10-06

  The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R2, R3, R5, R7, R8, and R10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R4 and R6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R4 and R6 are linked together to form an alkylene group, —O—, or —S—; R9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR11; R11 represents an alkyl group; X represents —O— or >N—R12; R12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O)n; n is an integer of 0 to 2; and the wavy lines represent that either R8 or R9 may be in an endo or exo position.

  该发明提供了一种新型丙烯酸酯衍生物，可以形成聚合物的结构单元，被纳入到光刻胶组成中；通过含有丙烯酸酯衍生物的原料聚合而成的聚合物；以及包含聚合物的光刻胶组成，与传统的光刻胶相比，能够实现形成具有改善LWR的高分辨率抗蚀图案。具体而言，本发明提供了例如以下式（1）所表示的丙烯酸酯衍生物：其中，R1代表氢原子、甲基基团或三氟甲基基团；R2、R3、R5、R7、R8和R10中的每一个代表氢原子、烷基、环烷基或烷氧基；R4和R6中的每一个代表氢原子、烷基、环烷基或烷氧基，或者R4和R6连接在一起形成烷基、—O—或—S—；R9代表氢原子、烷基、环烷基、烷氧基或—COOR11；R11代表烷基；X代表—O—或>N—R12；R12代表氢原子或烷基；Y代表>C═O或>S(═O)n；n是0到2的整数；波浪线表示R8或R9可以处于内部或外部位置。