申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP4020083A1
公开(公告)日:2022-06-29
A material for forming an organic film contains (A) a polymer having a repeating unit shown by the following general formula (1), and (B) an organic solvent. In the general formula (1), AR1, AR2, AR3, and AR4 each represent a benzene ring or a naphthalene ring; W1 represents a tetravalent organic group having 6 to 70 carbon atoms and at least one or more aromatic rings; and W2 represents a divalent organic group having 1 to 50 carbon atoms. An object of the present invention is to provide: a material for forming an organic film to enable high etching resistance and excellent twisting resistance without impairing the resin-derived carbon content; a patterning process using this material; and a polymer suitable for such a material for forming an organic film.
一种用于形成有机薄膜的材料包含(A)具有以下通式(1)所示重复单元的聚合物和(B)有机溶剂。在通式(1)中,AR1、AR2、AR3 和 AR4 分别代表苯环或萘环;W1 代表具有 6 至 70 个碳原子和至少一个或多个芳香环的四价有机基团;W2 代表具有 1 至 50 个碳原子的二价有机基团。本发明的目的是提供:一种用于形成有机薄膜的材料,在不影响树脂衍生碳含量的情况下实现高抗蚀刻性和优异的抗扭曲性;一种使用这种材料的图案化工艺;以及一种适用于这种用于形成有机薄膜的材料的聚合物。