A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
一种光敏组合物包括一种含
氟溶剂,一种光酸发生剂和一种共聚物。该共聚物包括至少三个不同的重复单元,包括第一个重复单元具有含
氟基团,第二个重复单元具有酸催化交联基团,第三个重复单元具有敏化
染料。该组合物在制造电子设备中特别是有机电子和
生物电子设备中有用。