Highly selective deprotection of silyl ethers by NaIO4 in THF-H2O (4:1) is reported. The mild neutral conditions enable efficient applications to complex, polyfunctional, and sensitive substrates.
据报道,NaIO4 在 THF-
H2O (4:1) 中对甲
硅烷基醚进行高选择性脱保护。温和的中性条件使得能够有效地应用于复杂、多功能和敏感的基材。