5-Propyl-1,3-dioxan-2-one | 89435-16-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二恶烷
• 英文名称: 5-Propyl-1,3-dioxan-2-one
• CAS: 89435-16-5
• 化学式: C₇H₁₂O₃
• 分子量: 144.17
• InChiKey: DKXBERCQHBQWNO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190107779A1

  公开（公告）日：2019-04-11

  A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra 01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra 01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra 02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra 01 is bonded; and when Ra 01 is an alkyl group, Ra 02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.

  一种抗蚀组合物，包括具有由公式（a0-1）所代表的化合物衍生的结构单元的树脂组分，其中W代表含有聚合基团的基团；Ra01代表含有氧原子或硫原子的烷基或芳香杂环基团；在Ra01为含有氧原子或硫原子的芳香杂环基团的情况下，Ra02是与Ra01连接的三级碳原子（*C）一起形成含有电子提取基团的脂环基团的基团；而当Ra01为烷基时，Ra02是含有电子提取基团的脂环基团与含有氧原子或硫原子的芳香杂环基团形成的紧缩环。
• Resist composition, method for forming resist pattern, compound, and acid generator
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10394122B2

  公开（公告）日：2019-08-27

  A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rb1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yb1 represents a divalent linking group containing an ester bond (—C(═O)—O— or —O—C(═O)—), Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mm+ represents an m-valent organic cation. Rb1—Yb1—Vb1—CF2—SO3−(Mm+)1/m  (b1)

  一种抗蚀剂组合物，该抗蚀剂组合物在曝光时产生酸，并在酸的作用下改变在显影液中的溶解度，该抗蚀剂组合物含有在酸的作用下其在显影液中的溶解度会发生变化的碱基材料成分和通式（b1）表示的酸发生器。在通式（b-1）中，Rb1 代表芳香烃基团，其取代基至少有一个具有 3 个或更多碳原子的烷基，Yb1 代表含有酯键（-C(═O)-O-或-O-C(═O)-）的二价连接基团，Vb1 代表亚烷基、氟化亚烷基或单键，m 是 1 或更多的整数，Mm+ 代表 m 价有机阳离子。 Rb1-Yb1-Vb1-CF2-SO3-(Mm+)1/m (b1)
• Resist composition, method of forming resist pattern, polymeric compound, and compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10908502B2

  公开（公告）日：2021-02-02

  A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.

  一种抗蚀剂组合物，包括具有由式（a0-1）表示的化合物衍生的结构单元的树脂组分，其中 W 代表含可聚合基团；Ra01 代表烷基或含有氧原子或硫原子的芳香杂环基团；当 Ra01 是含有氧原子或硫原子的芳香杂环基团时，Ra02 是与 Ra01 键合的叔碳原子（*C）一起形成含有抽电子基团的脂肪族环状基团的基团；当 Ra01 是烷基时，Ra02 是含有抽电子基团的脂肪族环状基团与含有氧原子或硫原子的芳香杂环基团一起形成缩合环的基团。
• Resist composition, method of forming resist pattern, compound, and acid generator
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11221557B2

  公开（公告）日：2022-01-11

  A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, M1m+ represents a sulfonium cation having a sulfonyl group, R001 to R003 each independently represent a monovalent organic group; provided that at least one of R001 to R003 is an organic group having an acid dissociable group; and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

  一种含有通式(bd1-1)、(bd1-2)或(bd1-3)所代表的化合物的抗蚀剂组合物；在通式中，Rx1至Rx4代表烃基或氢原子，或可相互键合形成环状结构；Ry1至Ry2代表烃基或氢原子，或可相互键合形成环状结构，Rz1至Rz4代表烃基或氢原子，或可相互键合形成环状结构。Rx1至Rx4、Ry1至Ry2和Rz1至Rz4中至少有一个具有阴离子基团，M1m+代表具有磺酰基的锍阳离子，R001至R003各自独立地代表一价有机基团；条件是R001至R003中至少有一个是具有酸可解离基团的有机基团；M3m+代表具有抽电子基团的m价有机阳离子。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174366A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that at least two of R bd1 to R bd3 are aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; X − represents a counter anion.