1-(4-Chlorophenyl)-2-(naphthalen-2-yl)-1,1,2,2-tetraoxo-1lambda~6~,2lambda~6~-disulfane | 91222-53-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-(4-Chlorophenyl)-2-(naphthalen-2-yl)-1,1,2,2-tetraoxo-1lambda~6~,2lambda~6~-disulfane
• 英文别名: 2-(4-chlorophenyl)sulfonylsulfonylnaphthalene
• CAS: 91222-53-6
• 化学式: C₁₆H₁₁ClO₄S₂
• 分子量: 366.8
• InChiKey: JHCRVPXNYGPYQT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  23
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
• Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
  申请人：Imai Genji

  公开号：US20090045552A1

  公开（公告）日：2009-02-19

  Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.
• POSITIVE PHOTOSENSITIVE COMPOSITION
  申请人：Kodama Kunihiko

  公开号：US20090148791A1

  公开（公告）日：2009-06-11

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
• PHOTOSENSITIVE COMPOSITION
  申请人：HATTORI Shigeki

  公开号：US20090208866A1

  公开（公告）日：2009-08-20

  A photosensitive composition is provided, which includes a compound expressed by the formula T3 and a photo-acid generator which generates an acid by an action of actinic radiation. In the formula T3, R 3 s are hydrogen atoms and hydrophobic groups. The hydrophobic groups are selected from the group consisting of (AD-1), (AD-2), and (AD-3) shown below, and the hydrogen atoms are partially substituted with a hydrophilic group (LA) shown below.