4,5-Dimethoxy-2-nitrobenzyl perfluorooctanoate | 81559-52-6

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 4,5-Dimethoxy-2-nitrobenzyl perfluorooctanoate
• 英文别名: (4,5-Dimethoxy-2-nitrophenyl)methyl 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanoate
• CAS: 81559-52-6
• 化学式: C₁₇H₁₀F₁₅NO₆
• 分子量: 609.246
• InChiKey: ISPDGEAURSNRTE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  39
• 可旋转键数：
  11
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.59
• 拓扑面积：
  90.6
• 氢给体数：
  0
• 氢受体数：
  21

文献信息

• Imaging process and article employing photolabile, blocked surfactant
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0046028A2

  公开（公告）日：1982-02-17

  A photosensitive element is provided by an actinic radiation-transmissive film-forming polymeric material which contains photolabile blocked surfactant capable upon exposure to actinic radiation of releasing a detectable quantity of surfactant in actinic radiation exposed areas in areas not exposed to actinic radiation and unblocked surfac- tant in an image-wise pattern in the actinic radiation exposed areas. An imaging process is also provided comprising providing the actinic radiation-sensitive element and exposing the actinic radiation-sensitive element to actinic radiation in an image-wise pattern at an intensity and for a time sufficient to release an image-wise pattern of released surfactant in the exposed area.

  提供了一种光敏元件，它是由一种可透射光的成膜聚合物材料制成的，该材料含有可被光阻断的表面活性剂，在暴露于光辐射时，该表面活性剂能在未暴露于光辐射的区域中暴露于光辐射的区域中释放出可检测数量的表面活性剂，并能在暴露于光辐射的区域中以图像模式释放出未被阻断的表面活性剂。还提供了一种成像工艺，包括提供阳极辐射敏感元件，并将阳极辐射敏感元件以一定强度和时间按图像方向照射阳极辐射，足以在照射区域释放出按图像方向的表面活性剂。
• Photolabile blocked surfactants and compositions containing the same
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0046083A2

  公开（公告）日：1982-02-17

  Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

  本发明提供的表面活性剂（此处称为 "光敏阻滞表面活性剂"）被光敏保护基团或掩蔽基团阻滞，但在暴露于光辐射时会解除阻滞。通过将光亲和性受阻表面活性剂与聚合物成膜材料混合，可提供在辐照时形成表面活性剂的涂层组合物。 含有光敏封端表面活性剂的组合物在用作各种基材的保护涂层或压敏胶带的粘合剂时非常有用。虽然最初能很好地粘附在基材上，但当基材暴露在适当的辐射下，表面活性剂就会解除阻塞，从而恢复其表面活性剂的活性，这样，这种组合物就可以很容易地从基材上去除。
• US4478967A
  申请人：——

  公开号：US4478967A

  公开（公告）日：1984-10-23
• US4599273A
  申请人：——

  公开号：US4599273A

  公开（公告）日：1986-07-08
• US4740600A
  申请人：——

  公开号：US4740600A

  公开（公告）日：1988-04-26