ethyl 5-cyclopropyl-1-(naphthalen-1-yl)-1H-pyrazole-4-carboxylate | 241799-40-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: ethyl 5-cyclopropyl-1-(naphthalen-1-yl)-1H-pyrazole-4-carboxylate
• 英文别名: Ethyl 5-cyclopropyl-1-naphthalen-1-ylpyrazole-4-carboxylate
• CAS: 241799-40-6
• 化学式: C₁₉H₁₈N₂O₂
• 分子量: 306.364
• InChiKey: GHDJELGBGYOYLT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  23
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.26
• 拓扑面积：
  44.1
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
  申请人：Hasegawa Koji

  公开号：US20050142491A1

  公开（公告）日：2005-06-30

  Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R 1 and R 2 each independently represents a hydrogen atom or a linear, branched or cyclic C 1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH 2 — may be substituted by an oxygen atom, or R 1 and R 2 may be coupled together to form an aliphatic hydrocarbon ring; R 3 represents a linear, branched or cyclic C 1-10 alkyl group or a C 1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH 2 , oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.

  提供一种新型环氧化合物，可用于光刻工艺中，作为单体制备出具有透明性和对基底亲和力优异的光阻材料。更具体地，提供了一种由以下式（1）表示的环氧化合物：其中，R1和R2各自独立表示氢原子或线性、支链或环状的C1-10烷基基团，其中其一个或多个构成碳原子上的氢原子可以部分或完全被一个或多个卤素原子替代，或者该构成基团的—CH2—可以被一个氧原子替代，或者R1和R2可以结合形成脂肪族碳氢环；R3表示线性、支链或环状的C1-10烷基基团或C1-15酰基或烷氧羰基基团，其中其一个或多个构成碳原子上的氢原子可以部分或完全被一个或多个卤素原子替代；X表示 、氧或硫；k表示0或1；m表示0到5之间的整数；以及可从中获得重复单元的聚合物化合物。
• N-[(substituted five-membered di-or triaza diunsaturated ring)carbonyl] guanidine derivatives for the treatment of ischemia
  申请人：Pfizer Inc.

  公开号：US20030149043A1

  公开（公告）日：2003-08-07

  NHE-1 inhibitors, methods of using such NHE-1 inhibitors and pharmaceutical compositions containing such NHE-1 inhibitors. The NHE-1 inhibitors are useful for the reduction of tissue damage resulting from tissue ischemia.

  NHE-1抑制剂，使用这种NHE-1抑制剂的方法以及含有这种NHE-1抑制剂的制药组合物。NHE-1抑制剂对于减少组织缺血引起的组织损伤是有用的。
• N- (substituted five-membered di-or triaza diunsaturated ring)carbonyl guanidine derivateives for the treatment of ischemia
  申请人：Pfizer Products Inc.

  公开号：EP1454902A1

  公开（公告）日：2004-09-08

  This invention relates to NHE-1 inhibitors, methods of using such NHE-1 inhibitors and pharmaceutical compositions containing such NHE-1 inhibitors. The NHE-1 inhibitors are useful for the reduction of tissue damage resulting from tissue ischemia.

  本发明涉及 NHE-1 抑制剂、使用这种 NHE-1 抑制剂的方法以及含有这种 NHE-1 抑制剂的药物组合物。NHE-1 抑制剂可用于减少组织缺血造成的组织损伤。
• POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3398983A1

  公开（公告）日：2018-11-07

  This is to provide a polymer of a polyimide precursor which is soluble in an aqueous alkaline solution, and capable of using a base resin of a positive type and negative type photosensitive resin composition which is capable of forming a fine pattern and obtaining high resolution. Also provided is a positive type and negative type photosensitive resin composition using such a polymer of a polyimide precursor. Further provided are a patterning process and a method of forming a cured film using the composition. Provided is a polymer of a polyimide precursor which comprises a structural unit represented by the following general formula (1), wherein, X1, R1, Z, a repeating number "s", Y1, Rf, a repeating number "n" and "k" represent the same meanings as mentioned in the specification.

  本发明旨在提供一种可溶于碱性水溶液的聚酰亚胺前体聚合物，该聚合物可用于正型和负型感光树脂组合物的基底树脂，可形成精细图案并获得高分辨率。此外，还提供了使用这种聚酰亚胺前体聚合物的正型和负型感光树脂组合物。此外，还提供了一种图案化工艺和一种使用该组合物形成固化膜的方法。 本发明提供了一种聚酰亚胺前体聚合物，它包括由以下通式 (1) 表示的结构单元、 其中，X1、R1、Z、重复数 "s"、Y1、Rf、重复数 "n "和 "k "的含义与说明书中所述相同。
• Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US11150556B2

  公开（公告）日：2021-10-19

  This is to provide a polymer of a polyimide precursor which is soluble in an aqueous alkaline solution, and capable of using a base resin of a positive type and negative type photosensitive resin composition which is capable of forming a fine pattern and obtaining high resolution. Also provided is a positive type and negative type photosensitive resin composition using such a polymer of a polyimide precursor. Further provided are a patterning process and a method of forming a cured film using the composition. Provided is a polymer of a polyimide precursor which comprises a structural unit represented by the following general formula (1), wherein, X1, R1, Z, a repeating number “s”, Y1, Rf, a repeating number “n” and “k” represent the same meanings as mentioned in the specification.

  本发明旨在提供一种可溶于碱性水溶液的聚酰亚胺前体聚合物，该聚合物可用于正型和负型感光树脂组合物的基底树脂，可形成精细图案并获得高分辨率。此外，还提供了使用这种聚酰亚胺前体聚合物的正型和负型感光树脂组合物。此外，还提供了使用该组合物形成固化薄膜的图案化工艺和方法。 本发明提供了一种聚酰亚胺前体聚合物，该聚合物由以下通式 (1) 所代表的结构单元组成、 其中，X1、R1、Z、重复数字 "s"、Y1、Rf、重复数字 "n "和 "k "代表的含义与说明书中提到的相同。