di(p-tolyl)iodonium nonafluoro-n-butanesulfonate | 488820-76-4

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: di(p-tolyl)iodonium nonafluoro-n-butanesulfonate
• 英文别名: Bis-(4-methylphenyl) iodonium nonafluorobutane sulfonate；Bis(4-methylphenyl)iodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• CAS: 488820-76-4
• 化学式: C₄F₉O₃S*C₁₄H₁₄I
• 分子量: 608.263
• InChiKey: BHMNZHNPRJNOOJ-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.39
• 重原子数：
  32
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  12

文献信息

• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Polymers having silicon-containing acetal or ketal functional groups
  申请人：3M Innovative Properties Company

  公开号：US20020055065A1

  公开（公告）日：2002-05-09

  The polymers of the present invention are characterized by having at least one pendent acetal or ketal functional group in which at least two substituents of the acetal/ketal carbon atom independently comprise at least one silicon atom. The compositions of the present invention are useful as positive working resist compositions, in particular as the top imaging layer in a bilayer resist scheme for use in the manufacture of integrated circuits.

  本发明的聚合物的特征在于至少具有一个侧链缩醛或缩酮官能团，其中缩醛/缩酮碳原子的至少两个取代基独立地包含至少一个硅原子。本发明的组合物可用作正向光刻胶组合物，特别是用于集成电路制造中双层光刻胶方案的顶层显影层。
• RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
  申请人：Clariant International Ltd.

  公开号：EP1033624A1

  公开（公告）日：2000-09-06

  A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.

  本发明提供了一种化学放大辐射敏感组合物，该组合物由成膜的羟基苯乙烯基树脂与鎓盐前体结合而成，鎓盐前体生成氟化烷磺酸作为光酸发生器。这种组合物既不会因放出气体而腐蚀设备，也不会产生 T 型图案轮廓，也不会因加工时间延迟而改变线宽，同时还具有高灵敏度和高分辨率，以及良好的图案轮廓和稳定性。
• Radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1253470A2

  公开（公告）日：2002-10-30

  A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 is monovalent acid-dissociable group), (B) an alkali insoluble or scarcely soluble resin comprising a recurring unit of the following formula (2), (R5 is hydrogen or monovalent organic group, R' hydrogen or methyl, n 1-3, m 0-3) and a recurring unit containing acid-dissociable group, and (C) a photoacid generator. The resin composition is useful as a chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure.

  一种辐射敏感树脂组合物，包括(A)下式(1)的化合物、 (R1、R2 和 R3 为氢、羟基或一价有机基团，R4 为一价酸解离基团），（B）碱不溶性或难溶性树脂，包括下式（2）的循环单元、 (R5 为氢或一价有机基团，R' 为氢或甲基，n 1-3，m 0-3)和含有酸可分解基团的循环单元，以及 (C) 光酸发生器。该树脂组合物可用作化学放大抗蚀剂，具有高灵敏度、高分辨率、高辐射透过率和表面平滑度，并且不会在过度曝光时出现部分不溶解的问题。