tris(4-fluorophenyl)sulfonium nonafluoro-n-butanesulfonate | 475598-84-6

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: tris(4-fluorophenyl)sulfonium nonafluoro-n-butanesulfonate
• 英文别名: tris(4-fluorophenyl)sulfonium nonafluorobutanesulfonate；1,1,2,2,3,3,4,4,4-Nonafluorobutane-1-sulfonate;tris(4-fluorophenyl)sulfanium
• CAS: 475598-84-6
• 化学式: C₄F₉O₃S*C₁₈H₁₂F₃S
• 分子量: 616.448
• InChiKey: DHESGAJKEVGVPV-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.16
• 重原子数：
  39
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  15

文献信息

• RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN
  申请人：Matsumura Nobuji

  公开号：US20090280433A1

  公开（公告）日：2009-11-12

  A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

  一种辐射敏感组合物包含（A）低分子量化合物，其具有一个或多个酸解离基团，该基团在酸作用下分解，以增强其在碱性显影液中的溶解性，并且每个分子具有一个或多个辐射敏感酸生成基团，该基团在施加活性射线或辐射时产生酸，并且其聚苯乙烯还原平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000，并且（B）溶剂。
• RADIATION-SENSITIVE COMPOSITION
  申请人：JSR Corporation

  公开号：US20130108962A1

  公开（公告）日：2013-05-02

  A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).

  一种辐射敏感组合物包括低分子量化合物、溶剂和除低分子量化合物外的辐射敏感酸发生剂。低分子量化合物具有一个或多个酸可解离基团，这些基团在酸的作用下分解，增强在碱性显影液中的溶解度，以及一个或多个辐射敏感酸生成基团，每个分子在施加活性射线或辐射时生成酸。低分子量化合物的聚苯乙烯还原数平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000。低分子量化合物不是从具有不饱和键的单体的链生长聚合中获得的。低分子量化合物的含量是辐射敏感组合物的100质量％的总固体成分的80质量％或更多。低分子量化合物是以下公式（1）所示的化合物。
• COMPOUND AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR Corporation

  公开号：EP2100870A1

  公开（公告）日：2009-09-16

  A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.

  下式（1）所示的化合物可用作辐射敏感组合物的材料，该组合物能够形成对电子束等有效响应的抗蚀剂薄膜，粗糙度低，并能稳定地形成高精度的微小图案。
• POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND
  申请人：MARUYAMA Ken

  公开号：US20100310987A1

  公开（公告）日：2010-12-09

  A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R 2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.
• RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER
  申请人：MARUYAMA Ken

  公开号：US20100331440A1

  公开（公告）日：2010-12-30

  A polymer includes a repeating unit shown by a general formula (1) in which R 1 represents a hydrogen atom or a methyl group, R 2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.