di(methoxyphenyl).p-tolylsulfonium nonafluoro-n-butanesulfonate | 928049-38-1

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: di(methoxyphenyl).p-tolylsulfonium nonafluoro-n-butanesulfonate
• 英文别名: Bis(2-methoxyphenyl)-(4-methylphenyl)sulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• CAS: 928049-38-1
• 化学式: C₄F₉O₃S*C₂₁H₂₁O₂S
• 分子量: 636.556
• InChiKey: FZZQJILRFCFFTA-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.06
• 重原子数：
  41
• 可旋转键数：
  7
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  14

文献信息

• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Anthracene derivative and radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1343048A2

  公开（公告）日：2003-09-10

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  本发明公开了一种可用作辐射敏感树脂组合物添加剂的新型蒽衍生物。蒽衍生物具有下式（1）、 其中 R1 基团分别代表羟基或具有 1-20 个碳原子的一价有机基团，n 为 0-9 的整数，X 为单键或具有 1-12 个碳原子的二价有机基团，R2 代表一价酸可分解基团。辐射敏感树脂组合物包括式（1）的蒽衍生物、不溶于碱或几乎不溶于碱但在酸存在下可溶于碱的树脂和光酸发生器。该组合物可用作利用深紫外线（以 KrF 准分子激光器和 ArF 准分子激光器为例）进行微加工的化学放大抗蚀剂。
• US6830868B2
  申请人：——

  公开号：US6830868B2

  公开（公告）日：2004-12-14