2-[4-[C-(1,1,2,2,3,3,3-heptafluoropropyl)-N-(1,1,2,2,3,3,4,4,4-nonafluorobutylsulfonyloxy)carbonimidoyl]phenoxy]ethyl 2-methylprop-2-enoate | 1000268-27-8

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 2-[4-[C-(1,1,2,2,3,3,3-heptafluoropropyl)-N-(1,1,2,2,3,3,4,4,4-nonafluorobutylsulfonyloxy)carbonimidoyl]phenoxy]ethyl 2-methylprop-2-enoate
• CAS: 1000268-27-8
• 化学式: C₂₀H₁₃F₁₆NO₆S
• 分子量: 699.367
• InChiKey: HOXUSRMCPISLFH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.3
• 重原子数：
  44
• 可旋转键数：
  14
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  99.6
• 氢给体数：
  0
• 氢受体数：
  23

文献信息

• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。