4a,5-Dihydro-3bH-4-oxa-cyclopropa[a]phenalene | 71451-67-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 4a,5-Dihydro-3bH-4-oxa-cyclopropa[a]phenalene
• 英文别名: 11-Oxatetracyclo[7.4.1.05,14.010,12]tetradeca-1,3,5(14),6,8-pentaene
• CAS: 71451-67-7
• 化学式: C₁₃H₁₀O
• 分子量: 182.222
• InChiKey: JLPCHSRWCUPRGO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  12.5
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• [EN] ALCOHOLS CONTAINING IMIDE MOIETIES AND REACTIVE OLIGOMERS PREPARED THEREFROM<br/>[FR] ALCOOLS CONTENANT DES FRACTIONS IMIDE ET DES OLIGOMÈRES RÉACTIFS PRÉPARÉS À PARTIR DE CEUX-CI
  申请人：NAT STARCH CHEM INVEST

  公开号：WO2009014541A1

  公开（公告）日：2009-01-29

  This invention relates to oligomeric compounds that are prepared by the reaction of a dianhydride with an amiπo-alcohol to yield an imide-diol intermediate, which is then esterified with a carboxylic acid to form a reactive oligomer. An exemplary reaction scheme is in formula (I).

  这项发明涉及通过二酸酐与氨基醇的反应制备寡聚合物化合物，从而产生酰亚胺二醇中间体，然后用羧酸酯化合成反应性寡聚体。一个示例反应方案如公式(I)所示。
• N-[2-hydroxy-3-(2H-benzotriazol-2-yl)benzyl]oxamides as light stabilisers
  申请人：ELF ATOCHEM NORTH AMERICA, INC.

  公开号：EP0593936A1

  公开（公告）日：1994-04-27

  This invention relates to novel UV absorbers, their methods of preparation, their use in stabilizing polymers and polymers so stabilized against the degradative effects of UV light. The novel compounds of formula I are oxamides which are substituted on one or both nitrogens with a 2-hydroxy-3-(2H-benzotriazol-2-yl)benzyl group. The 2-hydroxy-3-(2H-benzotriazol-2-yl)benzyl groups are efficient UV absorbing groups and the oxamide group contributes additional light stabilizing, heat stabilizing and metal complexing properties to the compounds. The compounds have low-volatility and are especially useful as UV stabilizers for engineering resins processed at high temperatures.

  这项发明涉及新型紫外线吸收剂，其制备方法，其在稳定聚合物中的使用以及通过紫外线光的降解作用而得到稳定的聚合物。公式I的新型化合物是氧酰胺，其在一个或两个氮上被2-羟基-3-(2H-苯并三唑-2-基)苯甲基基团取代。2-羟基-3-(2H-苯并三唑-2-基)苯甲基基团是高效的紫外线吸收基团，而氧酰胺基团则为化合物提供了额外的光稳定、热稳定和金属络合性能。这些化合物具有低挥发性，特别适用于在高温下加工的工程树脂的紫外线稳定剂。
• Patternable low dielectric constant materials and their use in ULSI interconnection
  申请人：Lin Qinghuang

  公开号：US20060105181A1

  公开（公告）日：2006-05-18

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本文所披露的可图案化低-k介电材料是具有一种或多种酸敏感的可成像功能基团的功能化聚合物。
• Patternable low dielectric constsnt materials and their use in ULSI interconnection
  申请人：International Business Machines Corporation

  公开号：US20040137241A1

  公开（公告）日：2004-07-15

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本文所披露的可图案化低-k介电材料是具有一种或多种酸敏感可成像功能基团的功能化聚合物。
• PATTERNABLE LOW DIELECTRIC CONSTANT MATERIALS AND THEIR USE IN ULSI INTERCONNECTION
  申请人：Lin Qinghuang

  公开号：US20080063880A1

  公开（公告）日：2008-03-13

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本发明所披露的可图案化低-k介电材料是具有一种或多种酸敏感可成像功能基团的功能化聚合物。