Perfluorohexane sulfonic anhydride | 109065-55-6

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: Perfluorohexane sulfonic anhydride
• 英文别名: 1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexylsulfonyl 1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexane-1-sulfonate
• CAS: 109065-55-6
• 化学式: C₆F₁₃SO₂OSO₂C₆F₁₃
• 分子量: 782.2
• InChiKey: VHQPMZJGKIGZSK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.3
• 重原子数：
  45
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  94.3
• 氢给体数：
  0
• 氢受体数：
  31

文献信息

• PROCESS FOR PRODUCING TRANS-DIBENZOXENOPYRROLE COMPOUND AND INTERMEDIATE THEREFOR
  申请人：Wang Weiqi

  公开号：US20110046393A1

  公开（公告）日：2011-02-24

  The invention provides a process for production of trans-dibenzoxenopyrrole compounds, in which reduction, leaving group conversion, hydrogenation and methylation are carried out in that order. The process of the invention allows trans-dibenzoxenopyrrole compounds to be produced by a simpler procedure than conventional processes. The invention further provides novel compounds obtained as intermediates in the process, and a process for their production.

  本发明提供了一种生产反式二苯并噁唑吡咯化合物的方法，其中按照还原、离去基转化、氢化和甲基化的顺序进行。本发明的方法比传统方法更简单，可以生产出反式二苯并噁唑吡咯化合物。本发明还提供了在该过程中获得的新型中间体化合物以及其生产方法。
• WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME
  申请人：Central Glass Company, Limited

  公开号：EP3340283A1

  公开（公告）日：2018-06-27

  [Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol.         (R1)aSi(H)b(OR2)4-a-b     [1]         R3-S(=O)2OH     [2]         R3-S(=O)2O-Si(H)3-c(R4)c     [3]

  [目的]提供一种憎水保护膜形成液体化学品，用于通过液体接触部件含有氯乙烯树脂的清洗机清洗晶片的过程。 [解决方案] 使用一种液体化学品，其中包括：由以下通式[1]表示的烷氧基硅烷；至少一种从以下通式[2]表示的磺酸、磺酸的酸酐、磺酸的盐和以下通式[3]表示的磺酸衍生物组成的组中选出的物质；以及至少一种从碳氢化合物、醚和硫醇组成的组中选出的稀释溶剂。 (R1)aSi(H)b(OR2)4-a-b[1]。 R3-S(=O)2OH [2] R3-S(=O)2O-Si(H)3-c(R4)c [3]
• Method for Cleaning Wafer, and Chemical Used in Such Cleaning Method
  申请人：Central Glass Company, Limited

  公开号：US20170287705A1

  公开（公告）日：2017-10-05

  Provided herein is a method for cleaning a wafer having a fine uneven surface pattern that at least partially contains a silicon element using a wafer cleaning device that includes a vinyl chloride resin as a liquid contacting member, the method including retaining a water-repellent protective film-forming chemical in at least a recessed portion of the uneven pattern to form a water-repellent protective film on a surface of the recessed portion, the water-repellent protective film-forming chemical containing: a monoalkoxysilane represented by the following general formula [1], (R 1 ) a Si(H) 3-a (OR 2 )  [1]; a sulfonic acid represented by the following general formula [2], R 3 —S(═O) 2 OH  [2]; and a diluting solvent, wherein the diluting solvent contains 80 to 100 mass % of alcohol with respect to the total 100 mass % of the diluting solvent.
• Wafer Washing Method, and Liquid Chemical Used in Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20180308683A1

  公开（公告）日：2018-10-25

  To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. A liquid chemical is used, which includes an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol. (R 1 ) a Si(H) b (OR 2 ) 4-a-b [1] R 3 —S(═O) 2 OH  [2] R 3 —S(═O) 2 O—Si(H) 3-c (R 4 ) c [3]
• US8288564B2
  申请人：——

  公开号：US8288564B2

  公开（公告）日：2012-10-16