Naphthalene-1,5-disulfonic acid bis-[(2-hydroxy-ethyl)-amide] | 71863-14-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: Naphthalene-1,5-disulfonic acid bis-[(2-hydroxy-ethyl)-amide]
• 英文别名: 1-N,5-N-bis(2-hydroxyethyl)naphthalene-1,5-disulfonamide
• CAS: 71863-14-4
• 化学式: C₁₄H₁₈N₂O₆S₂
• 分子量: 374.439
• InChiKey: AAEMFWJGVGQLFK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.3
• 重原子数：
  24
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  150
• 氢给体数：
  4
• 氢受体数：
  8

文献信息

• NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE-TYPE LITHOGRAPHIC PRINTING ORIGINAL PLATE, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
  申请人：FUJIFILM Corporation

  公开号：EP3358408A1

  公开（公告）日：2018-08-08

  A negative type photosensitive resin composition includes a polymer compound which has, in a main chain thereof, a constitutional unit A represented by Formula A-1, a constitutional unit B that is at least one of constitutional units represented by Formulae B-1, B-2, B-3, B-4, B-5, B-6, or B-7, and a constitutional unit C containing an ethylenically unsaturated group; and a polymerization initiator. A negative type planographic printing plate precursor includes an image recording layer containing the negative type photosensitive resin composition. A method of preparing a planographic printing plate includes, in order, an exposure step of image-exposing the negative type planographic printing plate precursor; and a development step of performing development by removing a non-exposed portion of the exposed negative type planographic printing plate precursor using a developer.

  底片型感光树脂组合物包括一种聚合物化合物，其主链中具有由式 A-1 表示的构型单元 A、由式 B-1、B-2、B-3、B-4、B-5、B-6 或 B-7 表示的构型单元中至少一个构型单元 B 和含有乙烯不饱和基团的构型单元 C；以及一种聚合引发剂。 底片型平版印刷板前体包括含有底片型感光树脂组合物的图像记录层。 制备平版印刷板的方法依次包括：对底片型平版印刷板前体进行图像曝光的曝光步骤；以及使用显影剂去除已曝光的底片型平版印刷板前体的未曝光部分以进行显影的显影步骤。
• Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound
  申请人：FUJIFILM CORPORATION

  公开号：US10437149B2

  公开（公告）日：2019-10-08

  Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.

  本发明提供了一种光敏树脂组合物，包括：具有多环结构且其主链中含有磺酰胺基团的高分子化合物；以及红外线吸收剂，其中多环结构具有至少一种选自融合环烃结构和融合多环芳烃结构的结构。
• PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND
  申请人：FUJIFILM CORPORATION

  公开号：US20170329225A1

  公开（公告）日：2017-11-16

  Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.
• NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PREPARING PLANOGRAPHIC PRINTING PLATE
  申请人：FUJIFILM CORPORATION

  公开号：US20180149975A1

  公开（公告）日：2018-05-31

  A negative type photosensitive resin composition includes a polymer compound which has, in a main chain thereof, a constitutional unit A represented by Formula A-1, a constitutional unit B that is at least one of constitutional units represented by Formulae B-1, B-2, B-3, B-4, B-5, B-6, or B-7, and a constitutional unit C containing an ethylenically unsaturated group; and a polymerization initiator. A negative type planographic printing plate precursor includes an image recording layer containing the negative type photosensitive resin composition. A method of preparing a planographic printing plate includes, in order, an exposure step of image-exposing the negative type planographic printing plate precursor; and a development step of performing development by removing a non-exposed portion of the exposed negative type planographic printing plate precursor using a developer.