4-cyclohexylphenyl-diphenylsulfonium perfluoro-n-octanesulfonate | 910606-40-5

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 4-cyclohexylphenyl-diphenylsulfonium perfluoro-n-octanesulfonate
• 英文别名: (4-Cyclohexylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate
• CAS: 910606-40-5
• 化学式: C₈F₁₇O₃S*C₂₄H₂₅S
• 分子量: 844.654
• InChiKey: YMDHAIOLBNPLOB-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  11.33
• 重原子数：
  54
• 可旋转键数：
  10
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.44
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  20

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER
  申请人：ASANO Yuusuke

  公开号：US20120156612A1

  公开（公告）日：2012-06-21

  A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R 1 represents a methyl group or the like, R 2 represents a hydrocarbon group that forms a cyclic structure, R 3 represents a fluorine atom or the like, R 4 represents a carbon atom, and n 1 is an integer from 1 to 7.

  一种辐射敏感树脂组合物包括第一聚合物，其中包括具有酸敏感基团的重复单元，在酸敏感基团解离后变为碱溶解性，并且包括辐射敏感酸发生剂。酸敏感基团具有通式（1）所示的结构。R1代表甲基基团或类似物，R2代表形成环状结构的碳氢基团，R3代表氟原子或类似物，R4代表碳原子，n1为1至7之间的整数。
• PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
  申请人：SATO Mitsuo

  公开号：US20120258402A1

  公开（公告）日：2012-10-11

  A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R 1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR 2 R 3 (OR 4 ), and R 2 to R 4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R 3 and R 4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R 3 and an oxygen atom bonded to R 4 .

  一种光阻剂组合物包括一个聚合物，该聚合物包括下式（1）所示的结构单元，以及一个光酸发生剂。在式（1）中，R1代表氢原子、氟原子、甲基基团或三氟甲基基团，Z代表与与X键合的碳原子一起形成具有3到20个碳原子的二价脂环族基团，X代表具有1到6个碳原子的脂肪二基基团，Y代表氢原子或—CR2R3(OR4)，R2到R4独立地代表氢原子或一价烃基团，其中R3和R4可选择地相互键合以与与R3键合的碳原子和与R4键合的氧原子一起形成环状醚结构。
• RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：MARUYAMA Ken

  公开号：US20120237876A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R 1 to R 3 independently represents a hydroxyl group, or the like. At least one of R 1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R 7 and R 11 independently represents a hydrogen atom, or the like. Each of R 8 to R 10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.

  一种辐射敏感树脂组合物包括溶剂和聚合物。该聚合物包括由式(I)表示的重复单元，由式(II)表示的重复单元，或两者兼有。R1至R3中的每一个独立地表示一个羟基或类似物。其中至少一个R1表示具有两个或更多杂原子的基团。l是从1到5的整数。m和n中的每一个独立地是从0到5的整数。R7和R11中的每一个独立地表示氢原子或类似物。R8到R10中的每一个独立地表示氢原子或类似物。A表示—O—或类似物。D表示取代或未取代的亚甲基基团或类似物。
• COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20190094695A1

  公开（公告）日：2019-03-28

  The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R 1 to R 4 bond. Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

  影片形成的组合物包括一个化合物，其中包括一个公式（1）的基团和一个溶剂。在公式（1）中，R1至R4分别代表氢原子，具有1至20个碳原子的一价有机基团，或者R1至R4一起代表具有3至20个环原子的环结构，该环结构与碳原子或R1至R4键合的碳链一起。Ar1代表通过从具有6至20个碳原子的芳香环中去除（n+3）个氢原子而获得的基团。n为0至9之间的整数。R5代表一个羟基，一个卤素原子，一个硝基，或者具有1至20个碳原子的一价有机基团。
• RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND
  申请人：Kimoto Takakazu

  公开号：US20120276482A1

  公开（公告）日：2012-11-01

  A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.

  一种辐射敏感性树脂组合物，包括具有下式（1）所代表的基团的第一聚合物和辐射敏感性酸发生剂。n是2到4的整数。X代表单键或二价有机基团。A代表（n+1）价的连接基团。每个Q独立地代表包括可溶于碱的基团的基团。