bis(4-t-butylphenyl)iodonium perfluoro-n-octanesulfonate | 213740-80-8

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: bis(4-t-butylphenyl)iodonium perfluoro-n-octanesulfonate
• 英文别名: di(4-tert-butylphenyl) iodonium perfluorooctanesulfonate；Iodonium, bis[4-(1,1-dimethylethyl)phenyl]-, salt with perfluoro-1-octanesulfonic acid (1:1)；bis(4-tert-butylphenyl)iodanium;1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate
• CAS: 213740-80-8
• 化学式: C₈F₁₇O₃S*C₂₀H₂₆I
• 分子量: 892.456
• InChiKey: GGKNUPBFZOOSQW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  6.91
• 重原子数：
  50
• 可旋转键数：
  10
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  20

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
  申请人：SATO Mitsuo

  公开号：US20120258402A1

  公开（公告）日：2012-10-11

  A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R 1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR 2 R 3 (OR 4 ), and R 2 to R 4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R 3 and R 4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R 3 and an oxygen atom bonded to R 4 .

  一种光阻剂组合物包括一个聚合物，该聚合物包括下式（1）所示的结构单元，以及一个光酸发生剂。在式（1）中，R1代表氢原子、氟原子、甲基基团或三氟甲基基团，Z代表与与X键合的碳原子一起形成具有3到20个碳原子的二价脂环族基团，X代表具有1到6个碳原子的脂肪二基基团，Y代表氢原子或—CR2R3(OR4)，R2到R4独立地代表氢原子或一价烃基团，其中R3和R4可选择地相互键合以与与R3键合的碳原子和与R4键合的氧原子一起形成环状醚结构。
• NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
  申请人：WU Hengpeng

  公开号：US20130330668A1

  公开（公告）日：2013-12-12

  The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R 1 represents a C 1 -C 20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and R d is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

  本发明涉及一种新型聚合物组合物，包括具有两个或更多重复单元和具有结构（1）的末端的新型聚合物：其中R1代表C1-C20取代或未取代的烷基基团，w为1-8的数字，X为氧（O）或氮（N），Rd为反应性基团。该发明还涉及使用该新型聚合物组合物形成图案的方法。该发明还涉及制备该新型聚合物的方法。