2-(3-Methylbutan-2-yloxy)naphthalene | 123622-20-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2-(3-Methylbutan-2-yloxy)naphthalene
• CAS: 123622-20-8
• 化学式: C₁₅H₁₈O
• 分子量: 214.307
• InChiKey: CECPVTQMPKWSBR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  sodium 2-naphtholate 以 乙醚 、 甲苯 为溶剂， 反应 4.0h， 生成 2-(3-Methylbutan-2-yloxy)naphthalene
  参考文献：
  名称：

  Reactions of 1-(.alpha.-alkoxyalkyl)- and 1-(.alpha.-(aryloxy)alkyl)benzotriazoles with the Grignard reagents. A new and versatile method for the preparation of ethers

  摘要：

  DOI：

  10.1021/jo00287a011

文献信息

• Polymer, positive resist composition, and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10191372B2

  公开（公告）日：2019-01-29

  A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.

  本发明提供了一种聚合物，它包含由乙烯基蒽醌衍生的递归单元、由酸性基团取代的羟基苯乙烯衍生的递归单元以及由羟基苯乙烯衍生的递归单元。该聚合物可用作基础树脂，配制出具有高分辨率和最小 LER 的正抗蚀剂组合物。
• POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170343898A1

  公开（公告）日：2017-11-30

  A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.