2,4,4-trimethyl-2',3',4',7,8-pentahydroxyflavan | 154778-50-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: 2,4,4-trimethyl-2',3',4',7,8-pentahydroxyflavan
• 英文别名: 4-(7,8-dihydroxy-2,4,4-trimethyl-3H-chromen-2-yl)benzene-1,2,3-triol
• CAS: 154778-50-4
• 化学式: C₁₈H₂₀O₆
• 分子量: 332.353
• InChiKey: JGZPFAHETFVONI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  24
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  110
• 氢给体数：
  5
• 氢受体数：
  6

文献信息

• Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same
  申请人：Miya Yoshiko

  公开号：US20080237553A1

  公开（公告）日：2008-10-02

  A colored photosensitive resin composition comprising an alkali-soluble resin, a photosensitive compound, a curing agent, a solvent and a colorant represented by the formula (I): The colored photosensitive resin composition can form a color filter array which shows good spectral characteristics.

  一种有色光敏树脂组合物，包括碱溶性树脂、光敏化合物、固化剂、溶剂和由式(I)表示的着色剂。该有色光敏树脂组合物可以形成一个显示良好光谱特性的彩色滤光片阵列。
• Nitrogen-containing heterocyclic compound
  申请人：Murakata Chikara

  公开号：US20090054407A1

  公开（公告）日：2009-02-26

  The present invention provides a nitrogen-containing heterocyclic compound represented by formula (I): wherein W represents a nitrogen atom or —CH—; X represents —C(═O)— or —CHR 4 — (wherein R 4 represents a hydrogen atom, or the like); R 1 represents a group represented by the following formula: [wherein Q 1 represents a nitrogen atom or —CR 8 — (wherein R 8 represents a hydrogen atom, substituted or unsubstituted lower alkyl, or the like). Q 2 represents —NR 15 — (wherein R 15 represents a hydrogen atom, or the like) and R 5 and R 6 may be the same or different and each represents a hydrogen atom, substituted or unsubstituted lower alkyl, or the like]; and R 2 and R 3 may be the same or different and each represents a hydrogen atom, halogen, substituted or unsubstituted lower alkyl, or the like} or a pharmaceutically acceptable salt thereof, and the like.

  本发明提供了一种含氮杂环化合物，其由式(I)表示：其中W代表氮原子或—CH—；X代表—C(═O)—或—CHR4—（其中R4代表氢原子或类似物）；R1代表由以下式表示的基团：[其中Q1代表氮原子或—CR8—（其中R8代表氢原子、取代或未取代的低级烷基或类似物）。Q2代表—NR15—（其中R15代表氢原子或类似物），R5和R6可以相同也可以不同，每个代表氢原子、取代或未取代的低级烷基或类似物]；R2和R3可以相同也可以不同，每个代表氢原子、卤素、取代或未取代的低级烷基或类似物}或其药学上可接受的盐等。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• Process for preparing hydroxyflavan compounds
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0688770A2

  公开（公告）日：1995-12-27

  A process for preparing a hydroxyflavan compound which comprises reacting a polyhydric phenol compound of formula (2): wherein at least one of W, X, Y and Z is hydroxy; with a ketone in the presence of (i) an acid catalyst and (ii) water and/or a seed crystal, using an organic solvent which is insoluble in water, produces the hydroxyflavan compound in high yield and with high selectivity while maintaining high conversion of the polyhydric phenol.

  一种制备羟基黄烷化合物的工艺，包括使式（2）的多水酚化合物发生反应： 其中 其中 W、X、Y 和 Z 中至少有一个是羟基； 与酮在(i)酸催化剂和(ii)水和/或籽晶存在下，使用不溶于水的有机溶剂，以高收率和高选择性生产羟基黄烷化合物，同时保持多氢苯酚的高转化率。
• Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0695740A1

  公开（公告）日：1996-02-07

  A compound represented by the general formula (I): wherein one of R¹ and R² represents -OQ⁴ and the other represents hydrogen, alkyl, cycloalkyl, alkenyl, alkoxy or halogen; R³, R⁴ and R⁵ each independently represent hydrogen, alkyl, cycloalkyl, alkenyl, alkoxy or halogen; provided that when R² is -OQ⁴, both of R³ and R⁴ are hydrogen or at least one of R¹ and R⁵ is alkyl, cycloalkyl, alkenyl, alkoxy; R⁶ and R⁷ each independently represent hydrogen, alkyl or alkenyl, or R⁶ and R⁷ form a cycloalkane ring; and Q¹, Q², Q³ and Q⁴ each independently represent hydrogen or an o-quinonediazide sulfonyl group, provided that at least one of Q¹, Q², Q³ and Q⁴ is an o-quinonediazide sulfonyl group; a process for producing the same; a photosensitizer comprising the same; and a positive resist composition comprising the same; and    1,2,3-Trihydroxy-4-(4-hydroxy-2,5-dimethylbenzyl) benzene and a positive resist composition comprising the same.

  通式 (I) 所代表的化合物： 其中 R¹ 和 R² 中的一个代表 -OQ⁴，另一个代表氢、烷基、环烷基、烯基、烷氧基或卤素；R³、R⁴ 和 R⁵ 各自独立地代表氢、烷基、环烷基、烯基、烷氧基或卤素；条件是当 R² 为 -OQ⁴ 时，R³ 和 R⁴ 均为氢或 R¹ 和 R⁵ 中至少有一个为烷基、环烷基、烯基、烷氧基； R⁶ 和 R⁷ 各自独立地代表氢、烷基或烯基，或 R⁶ 和 R⁷ 构成环烷环；以及 Q¹、Q²、Q³ 和 Q⁴ 各自独立地代表氢或邻喹酮噻嗪磺酰基，条件是 Q¹、Q²、Q³ 和 Q⁴ 中至少有一个是邻喹酮噻嗪磺酰基； 生产上述物质的工艺；包含上述物质的光敏剂；以及包含上述物质的正抗蚀剂组合物；以及 1,2,3-三羟基-4-(4-羟基-2,5-二甲基苄基)苯和由其组成的正抗蚀剂组合物。