B(C<sub>6</sub>F<sub>5</sub>)<sub>3</sub>-Catalyzed Hydrodesulfurization Using Hydrosilanes – Metal-Free Reduction of Sulfides
作者:Kodai Saito、Kazumi Kondo、Takahiko Akiyama
DOI:10.1021/acs.orglett.5b01651
日期:2015.7.2
B(C6F5)3-catalyzed hydrodesulfurization of carbon–sulfur bonds was achieved using triethylsilane as the reducing agent. The corresponding products were obtained in good yields under mild reaction conditions. This protocol could be applied to the reduction of sulfides, including benzyl and alkyl sulfides and dithianes, with high chemoselectivities.
使用三乙基硅烷作为还原剂,实现了B(C 6 F 5)3催化的碳硫键加氢脱硫。在温和的反应条件下以高收率获得了相应的产物。该方案可用于具有高化学选择性的硫化物的还原,包括苄基和烷基硫化物以及二噻烷。
Mild Deprotection of Dithioacetals by TMSCl/NaI Association in CH
<sub>3</sub>
CN
A mild process using a combination of TMSCl and NaI in acetonitrile is used to regenerate carbonyl compounds from a variety of dithiane and dithiolane derivatives. This easy to handle and inexpensive protocol is also efficient to deprotect oxygenated and mixed acetals as 1,3-dioxanes, 1,3-dioxolanes and 1,3-oxathianes quantitatively. As a possible extension of this method, it was also showed that
在乙腈中使用 TMSCl 和 NaI 组合的温和工艺用于从各种二噻烷和二硫戊环衍生物中再生羰基化合物。这种易于操作且价格低廉的方案还可以有效地将含氧和混合缩醛作为 1,3-二氧六环、1,3-二氧戊环和 1,3-氧杂环己烷进行定量脱保护。作为该方法的可能扩展,还表明作为腙、N-甲苯磺酰腙和酮时的氮化底物在这些条件下反应良好,以高产率得到预期的酮。本文提出的方法是现有方法的一个很好的替代方案,因为它不使用金属、氧化剂、还原剂、酸性或碱性介质,并且以高产率获得酮产物。
Chlorotrimethylsilane and Sodium Iodide: A Remarkable Metal-Free Association for the Desulfurization of Benzylic Dithioketals under Mild Conditions
A novel metal‐free process allowing the reductive desulfurization of various benzylicdithioketals to afford diarylmethane and benzylester derivatives with good to excellent yields is reported. At room temperature, this mild reduction process requires only the use of TMSCl and NaI in CH2Cl2 and tolerates a large variety of functional groups.
Dithioacetals can be deprotected to afford carbonyl groups using the tantalum(V) chloride catalyzed oxidation of iodide ion by hydrogen peroxide under mild conditions.
The reaction of dithioacetals with 30% hydrogen peroxide in the presence of catalytic amounts of tantalum(V) and iodide ion effectively produced carbonyl compounds in high yields. Dithioacetals also can be deprotected using the niobium(V) catalyzed oxidation of iodide ion by hydrogen peroxide under mild conditions.