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3-Aethyl-3-<2>naphthyloxymethyl-oxetan | 3897-81-2

中文名称
——
中文别名
——
英文名称
3-Aethyl-3-<2>naphthyloxymethyl-oxetan
英文别名
3-ethyl-3-(2-naphthyloxymethyl)oxetane;3-Ethyl-3-(naphthalen-2-yloxymethyl)oxetane
3-Aethyl-3-<2>naphthyloxymethyl-oxetan化学式
CAS
3897-81-2
化学式
C16H18O2
mdl
——
分子量
242.318
InChiKey
DXOHXDQFIVFJGI-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    18
  • 可旋转键数:
    4
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.38
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

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文献信息

  • SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20170305848A1
    公开(公告)日:2017-10-26
    A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X − represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
    一种对活性能量射线具有高敏感度的新型磺鎓盐,包括该磺鎓盐的光酸发生剂以及含有该光酸发生剂的光敏组合物。该磺鎓盐由公式(a1)表示。在该公式中,R1和R2分别表示由公式(a2)表示的基团或可能被卤素原子取代的烷基基团,R1和R2彼此相连并且可以与公式中的原子形成环,R3表示由公式(a3)表示的基团或由公式(a4)表示的基团,A1表示S或类似物,X-表示一价阴离子,且R1和R2不同时为可能被卤素原子取代的烷基基团。在公式(a2)到(a4)中,环Z1表示芳香族碳氢环,R4、R6、R9和R10各自表示特定的一价基团,R5、R7和R8各自表示特定的二价基团,A2和A3各自表示S或类似物,m1表示0或更多的整数,n1和n2各自表示0或更多。
  • SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF
    申请人:Suzuki Issei
    公开号:US20110039205A1
    公开(公告)日:2011-02-17
    An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R 1 is a group represented by formula (2); R 2 and R 3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X − represents a monovalent polyatomic anion; R 4 to R 6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by —S—, —O—, —SO—, —SO 2 —, or —CO—.
    本发明的目的是提供一种具有足够光敏度的烷基鎓盐,能够通过活性能量射线,如可见光、紫外线、电子束和X射线来激发。本发明是一种由式(1)表示的烷基鎓盐。其中,R1是由式(2)表示的基团;R2和R3分别表示具有6至30个碳原子的芳基基团、具有4至30个碳原子的杂环烃基团、具有1至30个碳原子的烷基基团、具有2至30个碳原子的烯基基团或具有2至30个碳原子的炔基基团;X-表示单价多原子阴离子;R4至R6分别表示烷基基团或类似物;k表示0至4的整数;m表示0至3的整数;n表示0至4的整数;A表示由—S—、—O—、—SO—、—SO2—或—CO—表示的基团。
  • Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound
    申请人:TOAGOSEI CO., LTD.
    公开号:EP1069120A1
    公开(公告)日:2001-01-17
    A naphthalene derivative, binaphthalene derivative and biphenyl derivative, all having an oxetane group, capable of being cationically polymerized and a cationically curable compound containing a naphthalene derivative having an oxetanyl group and an aromatic compound having an epoxy group or an oxetanyl group.
    一种生物、联生物联苯生物,它们都具有一个氧杂环丁烷基团,能够被阳离子聚合,以及一种阳离子可固化的化合物,其中包含一个具有氧杂环丁烷基团的生物和一个具有环氧基团或氧杂环丁烷基团的芳香族化合物。
  • PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION
    申请人:San-Apro Limited
    公开号:EP2284165A1
    公开(公告)日:2011-02-16
    An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X- represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by -S-, -O-, -SO-, -SO2-, or -CO-.
    本发明的目的是提供一种锍盐,该锍盐对可见光、紫外线、电子束和 X 射线等活性能量射线具有足够的光敏性。本发明是一种由式(1)表示的锍盐。值得注意的是,R1 是式 (2) 所代表的基团;R2 和 R3 分别代表具有 6 至 30 个碳原子的芳基、具有 4 至 30 个碳原子的杂环烃基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基或具有 2 至 30 个碳原子的炔基;X- 代表一价多原子阴离子;R4 至 R6 分别代表烷基或类似物;k 代表 0 至 4 的整数;m 代表 0 至 3 的整数;n 代表 0 至 4 的整数;以及 A 代表由 -S-、-O-、-SO-、-SO2- 或 -CO- 所代表的基团。
  • Sulfonium salt, photoacid generator, and photosensitive composition
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US10059662B2
    公开(公告)日:2018-08-28
    A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R1 and R2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R1 and R2 are bonded to each other and may form a ring with the sulfur atom within the formula, R3 is the group represented by formula (a3) or the group represented by formula (a4), A1 represents S or the like, X− represents a monovalent anion, and R1 and R2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z1 represents an aromatic hydrocarbon ring, R4, R6, R9, and R10 each represents a specific monovalent group, R5, R7, and R8 each represents a specific divalent group, A2 and A3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
    一种对活性能量射线具有高灵敏度的新型锍盐,一种包括该锍盐的光酸发生器,以及一种含有该光酸发生器的光敏组合物。锍盐用式(a1)表示。在该式中,R1 和 R2 各自独立地代表由式(a2)表示的基团或可被卤素原子取代的烷基,R1 和 R2 相互键合并可与式中的原子形成环,R3 是由式(a3)表示的基团或由式(a4)表示的基团,A1 代表 S 或类似物,X- 代表一价阴离子,且 R1 和 R2 并非都是可被卤素原子取代的烷基。在式 (a2) 至 (a4) 中,环 Z1 代表芳香烃环,R4、R6、R9 和 R10 各代表特定的一价基团,R5、R7 和 R8 各代表特定的二价基团,A2 和 A3 各代表 S 或类似物,m1 代表 0 或以上的整数,n1 和 n2 各代表 0 或以上。
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