Coating liquid for forming insulating film and method for producing insulating film
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20040197484A1
公开(公告)日:2004-10-07
A coating liquid for forming insulating film which can form insulating film having high adhesion to semiconductor substrate is provided. The coating liquid for forming insulating film comprising following (A) and (B), wherein a water content in the coating liquid is not more than 1% by weight:
(A): a heat-reactive nonpolar compound or polymer thereof wherein the heat-reactive nonpolar compound is selected from the group consisting of a compound having not less than two C—C double bonds, a compound having not less than two C—C triple bonds and a compound having at least one C—C double bond and at least one C—C triple bond, (B): at least one compound selected from the group consisting of silane compounds represented by following formulae (1) to (3).
本发明提供了一种用于形成绝缘膜的涂布液,该涂布液可形成对半导体基底具有高附着力的绝缘膜。用于形成绝缘膜的涂布液包括以下(A)和(B),其中涂布液中的水含量不超过 1%(按重量计):
(A):热反应性非极性化合物或其聚合物,其中热反应性非极性化合物选自由具有不少于两个 C-C 双键的化合物、具有不少于两个 C-C 三键的化合物和具有至少一个 C-C 双键和至少一个 C-C 三键的化合物组成的组,(B):至少一种选自由以下式(1)至(3)表示的硅烷化合物组成的组的化合物。