N-(perfluoro-n-octanesulfonyloxy) succinimide | 350691-71-3

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: N-(perfluoro-n-octanesulfonyloxy) succinimide
• 英文别名: (2,5-Dioxopyrrolidin-1-yl) 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate
• CAS: 350691-71-3
• 化学式: C₁₂H₄F₁₇NO₅S
• 分子量: 597.206
• InChiKey: IFAMWFCILVCFKD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  36
• 可旋转键数：
  9
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  22

文献信息

• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Acid-degradable resin compositions containing ketene-aldehyde copolymer
  申请人：Sudo Atsushi

  公开号：US20050130057A1

  公开（公告）日：2005-06-16

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R 1 and R 2 independently represent hydrogen atom, halogen atom, C 1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R 4 group, S(O) n R 4 group, P(═O)(R 4 ) 2 group or M(R 4 ) 3 group; R 3 represents C 1-20 hydrocarbon group or a heterocyclic group: R 4 represents C 1-20 hydrocarbonoxy group, C 1-20 hydrocarbon group, C 1-20 hydrocarbonthio group or mono- or di-C 1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2 , and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于制备高灵敏度和高分辨率细微图案的抗蚀剂等组合物，通过增加曝光部分和未曝光部分之间的溶解度差异。可降解酸性组合物包含具有以下通式（I）所表示的重复单元的聚合物：其中，R1和R2独立地表示氢原子、卤素原子、C1-20碳氢基团、杂环基团、氰基团、硝基团、C（═O）R4基团、S（O）nR4基团、P（═O）（R4）2基团或M（R4）3基团；R3表示C1-20碳氢基团或杂环基团；R4表示C1-20碳氢氧基团、C1-20碳氢基团、C1-20碳氢硫基团或单烷基或二烷基氨基基团；M表示硅、锗、锡或铅原子；n为0、1或2，以及一种酸或能够响应外部刺激产生酸的化合物。
• Photosensitive polymers and resist compositions containing the same
  申请人：Samsung Electronics Co., Ltd.

  公开号：US20030224289A1

  公开（公告）日：2003-12-04

  A class of photosensitive polymers having special utility in a resist composition is disclosed, said polymers being prepared utilizing a vinyl oxy alkyl adamantane carboxylate monomer having a structural formula as shown below, the polymers having a weight average molecular weight in the range of about 3,000 to 50,000: 1 wherein x is an integer in the range of 2 to 6 inclusive. The photosensitive polymers of this invention include polymers having three or more monomer units and having the vinyl oxy alkyl adamantane carboxylate monomer polymerized with maleic acid anhydride and at least one monomer selected from the group consisting of a (meth)acrylate and norbornene derivative monomer.

  本发明揭示了一类具有特殊用途的光敏聚合物，其在抗蚀组合物中具有特殊用途，所述聚合物是利用具有以下结构式的乙烯氧基烷基金刚烷羧酸酯单体制备的，聚合物的重均分子量在约3,000至50,000之间：其中x是2至6之间的整数。本发明的光敏聚合物包括具有三个或更多单体单元的聚合物，其中乙烯氧基烷基金刚烷羧酸酯单体与马来酸酐和至少一种从甲基丙烯酸酯和去环戊烯衍生单体的群体中选择的单体共聚。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030219680A1

  公开（公告）日：2003-11-27

  A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.

  提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂，但在酸的作用下变得碱溶，以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元，其中R1通常是氢原子，而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。