(2-Hydroxy-hexafluor-2-propyl)-naphthalin | 2092-80-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: (2-Hydroxy-hexafluor-2-propyl)-naphthalin
• 英文别名: 1-(2-Hydroxy-hexafluor-2-propyl)-naphthalin；1,1,1,3,3,3-Hexafluoro-2-(naphthalen-1-yl)propan-2-ol；1,1,1,3,3,3-hexafluoro-2-naphthalen-1-ylpropan-2-ol
• CAS: 2092-80-0
• 化学式: C₁₃H₈F₆O
• 分子量: 294.196
• InChiKey: JZQDUXJAJJECEJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS
  申请人：CHEN KUANG-JUNG

  公开号：US20130040238A1

  公开（公告）日：2013-02-14

  A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions.

  一种负可展性底部防反射涂层（NDBARC）材料，包括含有脂肪族醇基团、芳香基团和羧酸基团的聚合物。NDBARC组合物在涂覆和烘烤后，不溶于典型的抗蚀剂溶剂，如丙二醇甲醚乙酸酯（PGMEA）。NDBARC材料还包括光酸发生剂，以及可选的交联化合物。在NDBARC材料中，羧酸提供了开发剂的溶解性，而仅有醇，仅有羧酸或它们的组合提供了对PGMEA的抗性。NDBARC材料具有抗抗蚀剂溶剂的性能，因此，在涂覆NDBARC时，NDBARC和抗蚀剂之间不会发生混合。经过曝光和烘烤后，负光刻胶和NDBARC层的光刻曝光部分由于聚合物的化学增强交联而变得不溶于开发剂。
• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF
  申请人：International Business Machines Corporation

  公开号：US20150050601A1

  公开（公告）日：2015-02-19

  The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

  本发明涉及一种可开发的底部抗反射涂层（BARC）组合物及使用该BARC组合物的图案形成方法。该BARC组合物包括第一聚合物，其具有第一羧基酸基团，含羟基的脂环族基团和第一色团基团；第二聚合物，其具有第二羧基酸基团，含羟基的非环族基团和第二色团基团；交联剂；以及辐射敏感的酸发生剂。第一和第二色团基团吸收100纳米至400纳米波长的光线。在图案形成方法中，先形成一层BARC组合物的BARC层，再在其上形成一层光阻层。经曝光后，通过显影剂选择性地去除光阻层和BARC层的未曝光区域，形成光阻层中的图案结构。该BARC组合物和图案形成方法特别适用于植入级别。
• WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF
  申请人：International Business Machines Corporation IBM

  公开号：EP2013659A2

  公开（公告）日：2009-01-14
• Wet developable bottom antireflective coating composition and method for use thereof
  申请人：Chen J. Kuang-Jung

  公开号：US20070243484A1

  公开（公告）日：2007-10-18

  The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
• US7563563B2
  申请人：——

  公开号：US7563563B2

  公开（公告）日：2009-07-21