tris(4-methylphenyl)sulfonium perfluorobutanesulfonate | 722538-68-3

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: tris(4-methylphenyl)sulfonium perfluorobutanesulfonate
• 英文别名: Tris-(4-methylphenyl) sulfonium nonafluorobutane sulfonate；Sulfonium, tris(4-methylphenyl)-, salt with perfluoro-1-butanesulfonic acid (1:1)；1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;tris(4-methylphenyl)sulfanium
• CAS: 722538-68-3
• 化学式: C₄F₉O₃S*C₂₁H₂₁S
• 分子量: 604.558
• InChiKey: LNNZBTQMEMKVJL-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.66
• 重原子数：
  39
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  12

文献信息

• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• Chemical amplifying type positive resist composition and sulfonium salt
  申请人：——

  公开号：US20020015913A1

  公开（公告）日：2002-02-07

  A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I): 1 wherein Q 1 and Q 2 is alkyl or a cycloalkyl, or Q 1 and Q 2 form, together with a sulfur atom to which Q 1 and Q 2 are adjacent, an heteroalicyclic group; Q 3 represents a hydrogen atom, Q 4 represents alkyl or a cycloalkyl, or Q 3 and Q4 form, together with a CHC(O) group to which Q 3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q 5 SO 3 − represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb); 2 wherein P 1 to P 5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P 6 SO 3 − and P 7 SO 3 − each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.

  一种化学放大型正电子抗蚀剂组合物，提供具有极大改善的线边粗糙度的抗蚀图案，并且在干法蚀刻抵抗、灵敏度和分辨率等各种抗蚀性能方面表现优异；并包括：（A）含有（a）由以下式（I）表示的烷基磺酸盐的酸发生剂：其中Q1和Q2是烷基或环烷基，或Q1和Q2与相邻的硫原子一起形成杂环脂肪族基；Q3代表氢原子，Q4代表烷基或环烷基，或Q3和Q4与相邻的CHC（O）基团一起形成2-氧代环烷基；以及Q5SO3-代表有机磺酸盐离子，以及（b）至少选择一种由以下式（IIa）表示的三苯基烷基磺酸盐和以下式（IIb）表示的二苯基碘酸盐的烷基磺酸盐；其中P1至P5代表氢、羟基、烷基或烷氧基；以及P6SO3-和P7SO3-各自独立地表示有机磺酸盐离子；以及（B）具有对酸不稳定的聚合单元的树脂，本身是碱不溶性或微溶性的，但在酸的作用下转变为碱可溶性。
• Method for producing resin for chemically amplified positive resist
  申请人：Okazaki Shinya

  公开号：US20070072120A1

  公开（公告）日：2007-03-29

  A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby the resin is obtained at a high yield.

  一种生产化学增感正性光阻树脂的方法，通过聚合至少一种单体和/或至少一种低聚物来提供化学增感正性光阻树脂，其中使用两个或更多的聚合引发剂来引发聚合，从而高产地获得树脂。
• RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
  申请人：Clariant International Ltd.

  公开号：EP1033624A1

  公开（公告）日：2000-09-06

  A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.

  本发明提供了一种化学放大辐射敏感组合物，该组合物由成膜的羟基苯乙烯基树脂与鎓盐前体结合而成，鎓盐前体生成氟化烷磺酸作为光酸发生器。这种组合物既不会因放出气体而腐蚀设备，也不会产生 T 型图案轮廓，也不会因加工时间延迟而改变线宽，同时还具有高灵敏度和高分辨率，以及良好的图案轮廓和稳定性。
• SILICA-INCLUDING MICROCAPSULE RESIN PARTICLES, METHOD FOR PRODUCING SAME, AND APPLICATION THEREOF
  申请人：Sekisui Plastics Co., Ltd.

  公开号：EP3424486A1

  公开（公告）日：2019-01-09

  Silica-including microcapsule resin particles including an outer shell constituted of a crosslinked polymer and a cavity partitioned with the outer shell, in which the silica-including microcapsule resin particles contain inside the cavity a porous structure in which silica particles are mutually connected, and have a volume average particle diameter of 0.5 to 100 µm.

  包含二氧化硅的微胶囊树脂颗粒，包括由交联聚合物构成的外壳和与外壳分隔开的空腔，其中包含二氧化硅的微胶囊树脂颗粒在空腔内含有二氧化硅颗粒相互连接的多孔结构，颗粒的体积平均直径为 0.5 至 100 微米。