Interactive study of straight-sided buckling patterns in thin films under compressive stress
作者:F. Cleymand、C. Coupeau、J. Colin、J. Grilhe
DOI:10.1051/epjap:2000113
日期:2000.4
In situ atomic force microscopy observations have been carried out of thin films under external compressive stress. Straight-sided buckling patterns arise perpendicular to the compression axis which tend to attract one another during propagation a few hundred nanometers apart. The mechanisms whereby these debonding patterns interact have been investigated taking into account the elastic energy of both the film and the substrate. The equilibrium distance between two straight-sided wrinkles has been determined; good agreement has been obtained between the experimental results and the mechanics involved.
对受到外部压缩应力作用的薄膜进行了原位原子力显微镜观察。出现了垂直于压缩轴的直边屈曲图案,这些图案在传播过程中往往相互吸引,相距几百纳米。考虑到薄膜和基底的弹性能量,我们对这些脱粘模式的相互作用机制进行了研究。确定了两条直边皱纹之间的平衡距离;实验结果与相关力学之间取得了良好的一致。