4,4-Dimethyl-1-pentanthiol | 110502-98-2

• 分子结构分类: 有机化合物 - 有机金属化合物
• 英文名称: 4,4-Dimethyl-1-pentanthiol
• 英文别名: 4,4-Dimethylpentane-1-thiol
• CAS: 110502-98-2
• 化学式: C₇H₁₆S
• 分子量: 132.27
• InChiKey: SPTABJXJCBLVRG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• COMPOSITIONS AND METHODS FOR THE TREATMENT OF METABOLIC SYNDROME
  申请人：Kandula Mahesh

  公开号：US20150080345A1

  公开（公告）日：2015-03-19

  The invention relates to the compounds of formula I and formula II or its pharmaceutical acceptable salts, as well as polymorphs, solvates, enantiomers, stereoisomers and hydrates thereof. The pharmaceutical compositions comprising an effective amount of compounds of formula I or formula II, and methods for treating or preventing or modulating metabolic syndrome may be formulated for oral, buccal, rectal, topical, transdermal, transmucosal, intravenous, parenteral administration, syrup, or injection. such compositions may be used to treatment of fasting hyperglycemia, diabetes mellitus type 2, impaired fasting glucose, impaired glucose tolerance, or insulin resistance, high blood pressure, central obesity (also known as visceral, male-pattern or apple-shaped adiposity), overweight with fat deposits mainly around the waist, decreased HDL cholesterol, elevated triglycerides, hyperuricemia, fatty liver (especially in concurrent obesity) progressing to NAFLD, polycystic ovarian syndrome (in women), hypophosphatemia, renal diseases, albuminuria, end stage renal disease, and acanthosis nigricans.

  本发明涉及化学式I和化学式II的化合物或其药学上可接受的盐，以及其多晶型、溶剂合物、对映体、立体异构体和水合物。包括化学式I或化学式II化合物的有效量的药物组合物，以及用于治疗、预防或调节代谢综合征的方法可以制成口服、颊内、直肠、局部、经皮、经粘膜、静脉、肠道、糖浆或注射剂的制剂。这些组合物可以用于治疗空腹高血糖、2型糖尿病、空腹血糖受损、糖耐量受损或胰岛素抵抗、高血压、中心性肥胖（也称为内脏、男性型或苹果形脂肪）、腰部脂肪沉积较多的超重、HDL胆固醇降低、甘油三酯升高、高尿酸血症、脂肪肝（尤其是伴有肥胖的进展到NAFLD）、多囊卵巢综合征（女性）、低磷血症、肾脏疾病、蛋白尿、晚期肾脏疾病和棕色糠疹。
• COMPOSITIONS AND METHODS FOR THE TREATMENT OF ASTHMA AND ALLERGY
  申请人：Kandula Mahesh

  公开号：US20150126593A1

  公开（公告）日：2015-05-07

  The invention relates to the compounds of formula I or its pharmaceutical acceptable salts, as well as polymorphs, solvates, enantiomers, stereoisomers and hydrates thereof. The pharmaceutical compositions comprising an effective amount of compounds of formula I, and methods for the treatment of asthma and allergy may be formulated for oral, buccal, rectal, topical, transdermal, transmucosal, intravenous, parenteral administration, syrup, or injection. Such compositions may be used to treatment of respiratory diseases, respiratory disorders, COPD, bronchitis, brain injury, inflammation, inflammatory skin diseases, asthma, allergic reactions, infections due to acute allergy, bronchospasm, respiratory distress, acute asthma, leukotrienes over activity, 5-LO enzyme activity and cancer.

  该发明涉及公式I的化合物或其药用可接受的盐，以及其多晶形、溶剂合物、对映体、立体异构体和水合物。包含公式I化合物的有效量的药物组合物，以及用于治疗哮喘和过敏的方法可以制备为口服、颊内、直肠、局部、经皮、经粘膜、静脉、肠道给药、糖浆或注射。这些组合物可用于治疗呼吸道疾病、呼吸系统疾病、慢性阻塞性肺病、支气管炎、脑损伤、炎症、炎症性皮肤病、哮喘、过敏反应、急性过敏感染、支气管痉挛、呼吸窘迫、急性哮喘、白三烯过度活跃、5-LO酶活性和癌症的治疗。
• Antibacterial compound
  申请人：SANKYO COMPANY, LIMITED

  公开号：US20030171330A1

  公开（公告）日：2003-09-11

  A compound of formula (I) 1 wherein R 1 and R 2 represent a hydrogen atom or an aryl, a heterocyclic, an alkyl or an alkenyl, which are optionally substituted, R 3 represents a hydrogen atom or a hydroxyl and X 1 and X 2 represent an oxygen atom, a sulfur atom or a nitrogen containing group, a pharmaceutically acceptable derivative thereof or a salt thereof. A pharmaceutical composition comprising the compound for the prevention or treatment of a bacterial infection. A method for the prevention or treatment of a bacterial infection in a warm-blooded animal comprising administering a pharmacologically effective amount of the compound.

  式（I）的化合物，其中R1和R2代表氢原子或芳基、杂环基、烷基或烯基，可以是可选择取代的；R3代表氢原子或羟基；X1和X2代表氧原子、硫原子或含氮基团，其药用上可接受的衍生物或盐。包括该化合物的药物组合物，用于预防或治疗细菌感染。一种方法，用于在温血动物中预防或治疗细菌感染，包括给予该化合物的药理有效量。
• COMPOSITIONS AND METHODS FOR THE TREATMENT OF CHRONIC DISEASES AND INFLAMMATORY DISORDERS
  申请人：KANDULA Mahesh

  公开号：US20150087660A1

  公开（公告）日：2015-03-26

  The invention relates to the compounds of formula I or its pharmaceutical acceptable salts, as well as polymorphs, solvates, enantiomers, stereoisomers and hydrates thereof. The pharmaceutical compositions comprising an effective amount of compounds of formula I, and methods for the treatment of chronic diseases and inflammatory disorders may be formulated for oral, buccal, rectal, topical, transdermal, transmucosal, intravenous, parenteral administration, syrup, or injection. Such compositions may be used to treatment of intermittent claudication, obstructed arteries in the limbs, vascular dementia, Peyronie's disease, neuropathic injuries, sickle cell disease, nausea and headaches in the mountains (altitude sickness), acute alcoholic and non-alcoholic steatohepatitis, alcoholic liver disease, fibrotic lesions induced by radiation therapy for cancer, cytokine release syndrome, endometriosis, venous disease, inflammation, cancer, stroke, thrombosis, sepsis, gangrene, infection, type 1 diabetes, type 2 diabetes, pancreatic beta cell degeneration, beta cell dysfunction, respiratory diseases, rheumatoid arthritis, arthritis, osteoarthritis and vascular disease.

  本发明涉及公式I化合物或其药学可接受的盐，以及其多晶形、溶剂化物、对映体、立体异构体和水合物。含有公式I化合物的有效量的药物组合物，以及用于慢性疾病和炎症性疾病的治疗方法可以制成口服、颊粘膜、直肠、局部、经皮、经粘膜、静脉、肌肉注射、糖浆或注射剂的形式。这些组合物可以用于间歇性跛行、肢体阻塞动脉、血管性痴呆、佩罗尼氏病、神经病理损伤、镰状细胞贫血、高山病（高原反应）引起的恶心和头痛、急性酒精性和非酒精性脂肪性肝炎、酒精性肝病、放射治疗引起的纤维化病变、细胞因子释放综合征、子宫内膜异位症、静脉疾病、炎症、癌症、中风、血栓形成、败血症、坏疽、感染、1型糖尿病、2型糖尿病、胰岛β细胞退化、β细胞功能障碍、呼吸系统疾病、类风湿性关节炎、关节炎、骨关节炎和血管疾病的治疗。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP
  申请人：Shibayama Wataru

  公开号：US20110143149A1

  公开（公告）日：2011-06-16

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R 1 a R 2 b Si(R 3 ) 4-(a+b) . A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.

  提供一种用于光刻的抗蚀底层膜形成组合物，用于形成可用作硬掩膜或底部防反射涂层的抗蚀底层膜，或者是不与抗蚀剂混合且具有比抗蚀剂更高的干法刻蚀速率的抗蚀底层膜。该组合物包括具有离子基的硅烷化合物，其中具有离子基的硅烷化合物是一种可水解的有机硅烷，其分子中具有一个离子基、其水解产物或水解缩合产物。该组合物用作光刻的抗蚀底层膜形成组合物。组合物包括具有离子基的硅烷化合物和不具有离子基的硅烷化合物，其中具有离子基的硅烷化合物在整个硅烷化合物中的摩尔比例小于1％，例如为0.01到0.95％。可水解的有机硅烷可以是式的化合物：R1aR2bSi（R3）4-（a+b）。通过将所述组合物按照权利要求1至14中的任一项涂布到半导体基片上并烘烤所得到的抗蚀底层膜。