申请人:Kim Jae-Hyun
公开号:US20060153987A1
公开(公告)日:2006-07-13
The present invention relates to an organic anti-reflective composition and a patterning method using the same, more particularly to an organic anti-reflective composition comprising a crosslinking agent, a light absorbing agent, a thermal acid generator, an organic solvent and an adhesivity enhancer, and a patterning method using the same. The organic anti-reflective composition of the present invention can solve the standing wave effect due to change in optical properties and resist thickness of the bottom film on the wafer, prevent change of critical dimension (CD) due to scattered reflection, and prevent pattern collapse of photosensitizer on top of the organic anti-reflective film, and thus can form stable 64 M, 256 M, 512 M, 1 G, 4 G and 16 G DRAM ultrafine pattern and of improving product yield.
本发明涉及一种有机防反射组合物及其使用的图案化方法,更具体地涉及一种有机防反射组合物,包括交联剂、吸光剂、热酸发生剂、有机溶剂和粘附性增强剂,以及使用该组合物的图案化方法。本发明的有机防反射组合物可以解决晶圆底部膜的光学性质和电阻厚度变化引起的驻波效应,防止散射反射引起的关键尺寸(CD)变化,防止有机防反射膜上的光敏剂图案崩溃,从而可以形成稳定的64M、256M、512M、1G、4G和16G DRAM超细图案并提高产品产量。