Resist composition, method of forming resist pattern, novel compound, and acid generator
申请人:Kawaue Akiya
公开号:US20100136478A1
公开(公告)日:2010-06-03
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R
5
represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
一种抗蚀组合物,包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分(A)和在暴露后产生酸的酸发生剂组分(B),酸发生剂组分(B)包括含有由通式(I)表示的阳离子基团的化合物的酸发生剂(B1)(在该式中,R5代表具有羰基、酯键或磺酰基的有机基团;Q代表二价连接基团)。