2,3-Dimethoxy-desoxybenzoin | 126346-98-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: 2,3-Dimethoxy-desoxybenzoin
• 英文别名: 1-(2,3-Dimethoxyphenyl)-2-phenylethanone
• CAS: 126346-98-3
• 化学式: C₁₆H₁₆O₃
• mdl: MFCD16350911
• 分子量: 256.301
• InChiKey: GBGVRPSUYCTSIE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.187
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Photochromic article and method of preparation
  申请人：——

  公开号：US20030043447A1

  公开（公告）日：2003-03-06

  A process for manufacture of a photochromic polymeric article comprising: providing a fluid polymerisable composition; subjecting the fluid polymerisable composition to a first curing step to provide a solid article of intermediate hardness; contacting the solid article of intermediate hardness with a photochromic substance; and subjecting the solid article of intermediate hardness to a further curing step to increase the hardness and provide a polymeric article imbibed with the photochromic substance

  一种制造光致变色聚合物制品的工艺包括：提供一种流体聚合物组合物；将流体聚合物组合物经过第一固化步骤，以提供一种中间硬度的实体制品；将中间硬度的实体制品与光致变色物质接触；并将中间硬度的实体制品经过进一步的固化步骤，以提高硬度并提供浸渍有光致变色物质的聚合物制品。
• Radiation sensitive polymer composition
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP0418870A2

  公开（公告）日：1991-03-27

  A radiation-sensitive composition is described, which is comprised of (a) a polymer containing repeating units [1] represented by the general formula wherin R₁ is a trivalent or tetravalent organic residue having at least two carbon atoms, R₂ is a divalent organic residue having at least two carbon atoms, R₃ is hydrogen or an alkali metal counter ion, and n is 1 or 2; (b) a compound containing a radiation-dimerizable or radiation-polymerizable unsaturated bond and an amino group or a quaternary ammonium salt; (c) a non-alicyclic organic compound having a boiling point not lower than 120°C, containing at least one functional linkage selected from the group consisting of ester linkage, ether linkage and ketone linkage, and containing neither amino group nor hydroxyl group; and (d) optionally a sensitizer. This composition can greatly improve the developability and can give heat-resistant polyimide relief patterns with a good edge sharpness and good mechanical properties.

  描述了一种辐射敏感组合物，它包括 (a) 含有通式[1]代表的重复单元的聚合物 其中 R₁ 是至少具有两个碳原子的三价或四价有机残基，R₂ 是至少具有两个碳原子的二价有机残基，R₃ 是氢或碱金属反离子，n 是 1 或 2； (b) 含有可辐射二聚体或可辐射聚合的不饱和键和氨基或季铵盐的化合物； (c) 沸点不低于 120℃的非脂环有机化合物，含有至少一种选自酯连接、醚连接 和酮连接的官能连接，且既不含氨基也不含羟基；及 (d) 可选的敏化剂。 这种组合物能大大提高显影性，并能制作出边缘锐利、机械性能良好的耐热聚酰亚胺浮雕图案。
• EP0868223A4
  申请人：——

  公开号：EP0868223A4

  公开（公告）日：1998-12-09
• RADIATION-CURED EDGE-MASKING PROCESS FOR HIGH SPEED ELECTROGALVANIZING
  申请人：USX ENGINEERS AND CONSULTANTS, INC.

  公开号：EP0868223A1

  公开（公告）日：1998-10-07
• RADIATION CURABLE RESIN COMPOSITION
  申请人：DSM N.V.

  公开号：EP0909399A1

  公开（公告）日：1999-04-21