2-Oxo-1,2-diphenylethyl 2-dodecylbenzene-1-sulfonate | 111264-00-7

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: 2-Oxo-1,2-diphenylethyl 2-dodecylbenzene-1-sulfonate
• 英文别名: (2-oxo-1,2-diphenylethyl) 2-dodecylbenzenesulfonate
• CAS: 111264-00-7
• 化学式: C₃₂H₄₀O₄S
• 分子量: 520.7
• InChiKey: WJCPFFCKFNLHFC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  10.5
• 重原子数：
  37
• 可旋转键数：
  17
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.41
• 拓扑面积：
  68.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Vapor deposited photoresists of anionically polymerizable monomers
  申请人：LOCTITE (IRELAND) Ltd.

  公开号：EP0233747A2

  公开（公告）日：1987-08-26

  A method for applying a polymeric resist coating of very high molecular weight to a suitable substrate without the necessity of elaborate purification steps and for ensuring adequate coverage of raised regions in three-­dimensionally patterned substrates. The method comprises exposing the substrate to be coated to the vapor of an anionically polymerizable monomer of the formula: CHR=CXY where X and Y are strong electron withdrawing groups and R is H or, provided that X and Y are both -CN, C₁-C₄ alkyl for sufficient time to deposit a polymerizable coating thereon. Particularly preferred monomers are 2-cyanoacrylate esters. The monomer condenses and polymerizes on the surface of the substrate to give a highly uniform high molecular weight polymeric coating which is useful as a resist coating in lithographic processes employing plasma or acid etch techniques.

  一种将分子量极高的聚合物抗蚀涂层涂覆到合适基底上的方法，无需复杂的净化步骤，并可确保充分覆盖三维图案基底上的凸起区域。该方法包括将待涂覆的基底暴露在式中阴离子可聚合单体的蒸汽中： CHR=CXY 其中 X 和 Y 是强取电子基团，R 是 H 或（如果 X 和 Y 都是-CN）C₁-C₄ 烷基，将其暴露足够长的时间以在其上沉积可聚合涂层。特别优选的单体是 2-氰基丙烯酸酯。单体在基底表面凝结聚合，形成高度均匀的高分子量聚合涂层，可在采用等离子或酸蚀刻技术的平版印刷工艺中用作抗蚀涂层。
• Photocatalysts for vinyl compounds activated by an electron donating hetero atom
  申请人：LOCTITE (IRELAND) Ltd.

  公开号：EP0249365A2

  公开（公告）日：1987-12-16

  Compositions of compounds having vinyl groups activated by electronically adjacent ether oxygen atoms, thioether sulfur atoms or tertiary amino atoms α- or β-sulfonyloxyacetophenone compounds which photodegrade to form sulfonic acids are photocurable by a cationic mechanism. Suitable examples of the vinyl compounds are vinyl ethers, p-stryloxy ethers and N-vinyl carbazole. Suitable examples of sulfonyloxyacetophenone compounds are the reaction products of α- or β-hydroxyacetophenone compounds and mono or plural sulfonyl chloride compounds.

  具有乙烯基并被电子相邻的醚氧原子、硫醚硫原子或三级氨基原子活化的α-或β-砜氧基苯乙酮化合物，经光降解后形成磺酸，可通过阳离子机制进行光固化。乙烯基化合物的合适例子有乙烯基醚、对-丙烯酰氧基醚和 N-乙烯基咔唑。磺酰氧基苯乙酮化合物的合适例子是 α- 或 β-羟基苯乙酮化合物与单个或多个磺酰氯化合物的反应产物。