4,4',4"-trihydroxy-3"-methoxytriphenylmethane | 40705-73-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4',4"-trihydroxy-3"-methoxytriphenylmethane
• 英文别名: 4,4',4'-Trihydroxy-3-methoxy-triphenylmethan；2-methoxy-4,4',4''-methanetriyl-tri-phenol；Bis-(4-hydroxy-phenyl)-(4-hydroxy-3-methoxy-phenyl)-methan；2-Methoxy-4,4',4''-methantriyl-tri-phenol；4-[Bis(4-hydroxyphenyl)methyl]-2-methoxy-phenol；4-[bis(4-hydroxyphenyl)methyl]-2-methoxyphenol
• CAS: 40705-73-5
• 化学式: C₂₀H₁₈O₄
• 分子量: 322.361
• InChiKey: TYHOGIGLTWTDIM-UHFFFAOYSA-N

物化性质

• 熔点：
  190-191 °C(Solv: acetic acid, 30% (64-19-7))
• 沸点：
  524.6±50.0 °C(Predicted)
• 密度：
  1.279±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  69.9
• 氢给体数：
  3
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  4,4',4"-trihydroxy-3"-methoxytriphenylmethane 生成 4,4,4-三羟基三甲苯
  参考文献：
  名称：

  FUNAOKA M.; ABE I., WOOD SCI. AND TECHNOL., 21,(1987) N 3, 261-279

  摘要：

  DOI：
• 作为产物：
  描述：

  香草醛 生成 4,4',4"-trihydroxy-3"-methoxytriphenylmethane
  参考文献：
  名称：

  FUNAOKA M.; ABE I., WOOD SCI. AND TECHNOL., 21,(1987) N 3, 261-279

  摘要：

  DOI：

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Synthesis and Antiviral Activities of Some 4,4'-Dihydroxytriphenylmethanes
  作者：Nobuko Mibu、Kazumi Yokomizo、Masaru Uyeda、Kunihiro Sumoto

  DOI：10.1248/cpb.51.1325

  日期：——

  4,4'-Dihydroxytriphenylmethanes were synthesized using Brønsted acid or Lewis acid in yields of 24-86% as target compounds for developing antiviral agents. Most of the 4,4'-dihydroxytriphenylmethanes showed significant activity against herpes simplex virus type 1 (anti-HSV-1 activity) in a plaque reduction assay. Higher cytotoxicity was observed generally in halogenated 4,4'-dihydroxytriphenylmethanes

  使用布朗斯台德酸或路易斯酸作为开发抗病毒药物的目标化合物，其收率为24-86％，合成了4,4'-二羟基三苯甲烷。在噬菌斑减少试验中，大多数4,4'-二羟基三苯甲烷均显示出对1型单纯疱疹病毒的显着活性（抗HSV-1活性）。通常在卤代的4,4'-二羟基三苯基甲烷（2a-d）中观察到比在非卤代衍生物中更高的细胞毒性。非卤代衍生物4,4'，4“-三羟基-3”-甲氧基三苯甲烷（3）具有出色的抗病毒活性，EC（50）值为1.8 microg / ml。
• HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME
  申请人：UNITIKA LTD.

  公开号：EP0943640A1

  公开（公告）日：1999-09-22

  The present invention provides a polyarylate film comprising 9,9-bis(alkyl-4-hydroxyphenyl)fluorene residue and bisphenol residue with a molar ratio of the former of in the range of 0.05 to 1 in which the carboxylic acid component is composed of terephthalic acid residue and isophthalic acid residue, wherein the polyarylate film having good abrasion resistance and heat resistance, being highly transparent and having less incident-angle dependent birefringence can be obtained by solvent casting of a polyarylate solution with an inherent viscosity in the range of 0.25 to 2.50. The film has high abrasion resistance, heat resistance and purity along with being excellent in such optical characteristics as high transparency and low birefringence, which is applicable as molding materials for use in electric, electronic and optical fields and in automobile industry; as insulating materials in electric appliances, power generators, capacitors and interlayer insulators; and as surface coating films as dielectric films for use in transformers, wire coating and capacitors, and substrates for liquid crystal display panel.

  本发明提供了一种聚芳酸酯薄膜，该薄膜由9,9-双(烷基-4-羟基苯基)芴残基和双酚残基组成，前者的摩尔比在0.其中羧酸组分由对苯二甲酸残留物和间苯二甲酸残留物组成，通过溶剂浇铸固有粘度在 0.25 至 2.50 范围内的聚芳酸酯溶液，可获得耐磨性和耐热性良好、透明度高且随事件角而产生的双折射较小的聚芳酸酯薄膜。这种薄膜具有很高的耐磨性、耐热性和纯度，同时还具有高透明度和低双折射等优异的光学特性，可用作电气、电子和光学领域以及汽车工业中的成型材料；用作电器、发电机、电容器和层间绝缘体中的绝缘材料；以及用作变压器、电线涂层和电容器中的介质薄膜和液晶显示面板基板的表面涂层薄膜。
• PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION
  申请人：CLARIANT INTERNATIONAL LTD.

  公开号：EP1146394A1

  公开（公告）日：2001-10-17

  A radiation sensitive resin composition which is capable of forming excellent patterns and is highly sensitive and excellent in dry-etching resistance, as well as a process on the improvement of dry-etching resistance. The radiation sensitive resin composition comprises an alkali-soluble resin, a radiation sensitive material and a compound with phenolic hydroxyl groups which has a value of 30 or more in parameter (P) shown in formula 1 below.[Formula 1] parameter (P) = [(13.0 x number of hydroxyl groups in an additive)/(number of benzene rings in an additive)] + [(14.0 x number of diazo- coupling reaction points in an additive) / (number of benzene rings in an additive)] wherein the number of diazo-coupling reaction points is the number of unsubstituted carbon atoms at o- and p-positions relative to the positions of hydroxyl groups in the benzene ring in the compound.

  一种能形成优异图案、灵敏度高且耐干蚀性优异的辐射敏感树脂组合物，以及一种改善耐干蚀性的工艺。辐射敏感树脂组合物由碱溶性树脂、辐射敏感材料和酚羟基化合物组成，酚羟基化合物的参数（P）值大于或等于 30，如下式 1 所示。 [式 1] 参数（P）=[（13.0 x 添加剂中的羟基数）/（添加剂中的苯环数）] + [（14.0 x 添加剂中的二羟基数）/（添加剂中的苯环数）]。+ [(14.0 x 添加剂中重氮偶联反应点数)/(添加剂中苯环数)]，其中重氮偶联反应点数是相对于化合物中苯环羟基位置的 o 位和 p 位未取代碳原子的数目。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。