Stepped substrate-coating composition containing polyether resin having photocrosslinkable group
申请人:NISSAN CHEMICAL CORPORATION
公开号:US10871712B2
公开(公告)日:2020-12-22
A stepped substrate-coating composition having high properties of filling a pattern and capable of forming on a substrate a coating film that can be formed by photocuring, has flattening properties, and has high heat resistance after irradiation with light. A photocurable composition for coating a stepped substrate, the photocurable composition containing a polymer containing a unit structure of Formula (1):
wherein A1, A2, and A3 are each independently an aromatic C6-100 ring optionally containing a heteroatom or a hydrocarbon group containing an aromatic C6-100 ring optionally containing a heteroatom, B1, B2, and B3 are each independently Formula (2):
wherein R1 is a C1-10 alkylene group, a C1-10 alkenylene group, a C1-10 alkynylene group, a C6-40 arylene group, an oxygen atom, a carbonyl group, a sulfur atom, —C(O)—O—, —C(O)—NRa—, —NRb—, or a group including a combination thereof, R2 is a hydrogen atom or a C1-10 alkyl group.
一种阶梯状基底涂层组合物,该组合物具有很高的图案填充性能,能够在基底上形成涂膜,该涂膜可通过光固化形成,具有平整性,并且在光照射后具有很高的耐热性。一种用于涂覆阶梯状基底的光固化组合物,该光固化组合物含有含有式(1)单元结构的聚合物:
其中 A1、A2 和 A3 各自独立地为可选含有一个杂原子的芳香族 C6-100 环或含有可选含有一个杂原子的芳香族 C6-100 环的烃基,B1、B2 和 B3 各自独立地为式 (2):
其中 R1 是 C1-10 亚烷基、C1-10 烯基、C1-10 亚炔基、C6-40 芳烯基、氧原子、羰基、硫原子、-C(O)-O-、-C(O)-NRa-、-NRb- 或包括其组合的基团,R2 是氢原子或 C1-10 烷基。