3-amino-naphthalene-2-thiol | 126764-61-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 3-amino-naphthalene-2-thiol
• 英文别名: 3-aminonaphthalene-2-thiol
• CAS: 126764-61-2
• 化学式: C₁₀H₉NS
• 分子量: 175.254
• InChiKey: AUSYVGSRIHOEPI-UHFFFAOYSA-N

物化性质

• 沸点：
  353.0±15.0 °C(Predicted)
• 密度：
  1.265±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  27
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  3-amino-naphthalene-2-thiol 在 氧气 作用下， 生成 2-naphtho[2,3-d]thiazol-2-yl-phenol
  参考文献：
  名称：

  Uhlemann,E.; Pohl,V., Zeitschrift fur Chemie, 1969, vol. 9, p. 385 - 387

  摘要：

  DOI：
• 作为产物：
  描述：

  Naphto<2,1-d>-1,2,3-dithiazolyl radikal 、 盐酸 生成 3-amino-naphthalene-2-thiol
  参考文献：
  名称：

  MAYER, R.;DOMSCHKE, G.;BLEISCH, S.;FABIAN, J.;BARTL, A.;STASKO, A., COLLECT. CZECH. CHEM. COMMUN., 1984, 49, N 3, 684-703

  摘要：

  DOI：

文献信息

• Yield of benzothiazine derivatives and catalysis by heteropolyacids
  作者：Alireza Samzadeh-Kermani

  DOI：10.1080/17415993.2016.1187733

  日期：2016.11.1

  An efficient heteropolyacid-catalyzed reaction for the synthesis of benzothiazine derivatives is reported. In this transformation, H3PW12O40 was employed as a catalyst in a reaction involving 2-aminobenzenethiols, acetylenic esters, and malonate esters. Optimum conditions are developed in i-PrOH at 50˚C for 7 h. GRAPHICAL ABSTRACT

  报道了一种用于合成苯并噻嗪衍生物的有效杂多酸催化反应。在这种转化中，H3PW12O40 被用作涉及 2-氨基苯硫醇、乙炔酯和丙二酸酯的反应中的催化剂。最佳条件是在 i-PrOH 中在 50°C 下培养 7 小时。图形概要
• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：International Business Machines Corporation

  公开号：US20210317270A1

  公开（公告）日：2021-10-14

  Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

  提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案，并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式（1）表示：其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团；X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种，并且它们可以相同也可以不同，只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团；Ar代表具有2到30个碳原子的二价芳香基团；L1和L2分别代表具有1到30个碳原子的二价碳氢基团；x和y分别独立地为0或1。
• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180120702A1

  公开（公告）日：2018-05-03

  The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.

  本发明提供了一种四羧酸二酯化合物，其表示为以下通式（1）：其中，X1表示四价有机基团，R1表示以下通式（2）所表示的基团：其中，虚线表示键合，Y1表示具有k+1价的有机基团，Rs表示含有至少一个硅原子的基团，“k”表示1、2或3，“n”表示0或1。可以提供一种四羧酸二酯化合物，该化合物能够引导聚合物的形成，该聚合物是由使用负光敏树脂组合物的基树脂制成的，该组合物能够形成细微图案并具有高分辨率，使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。
• NOVEL COMPOUNDS
  申请人：Hoffmann Torsten

  公开号：US20100160441A1

  公开（公告）日：2010-06-24

  The invention is concerned with compounds of formula I: wherein R, R 2 , and Q are as defined in the description and in the claims, as well as physiologically acceptable salts thereof. These compounds are useful as inhibitors of cholesteryl ester transfer protein (CETP).

  本发明涉及式I的化合物：其中R，R2和Q如描述和权利要求中定义的那样，以及其生理上可接受的盐。这些化合物可用作胆固醇酯转移蛋白（CETP）的抑制剂。