1,6-Dibromo-1,2-dihydronaphthalen-1-ol | 143106-23-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1,6-Dibromo-1,2-dihydronaphthalen-1-ol
• 英文别名: 1,6-dibromo-2H-naphthalen-1-ol
• CAS: 143106-23-4
• 化学式: C₁₀H₈Br₂O
• 分子量: 303.98
• InChiKey: HLRHGNXBKIAWLH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• Preparation of hydroxy aromatic carboxylic acids and ester derivatives thereof
  申请人：CELANESE CORPORATION

  公开号：EP0049616A1

  公开（公告）日：1982-04-14

  A process for preparing hydroxy aromatic carboxylic acids, or the ester derivatives thereof, comprises carbonylating a hydroxy aromatic halide in the presence of a reactive alcohol solvent and a catalytic amount of a Group VIII metal catalyst. The process has particular applicability to the preparation of 6-hydroxy-2-naphthoic acid from 6-bromo-2-naphthol, which can be easily prepared from β-naphthol, a readily available and inexpensive starting material.

  制备羟基芳香族羧酸或其酯类衍生物的工艺包括在活性醇溶剂和催化量的第八族金属催化剂存在下对羟基芳香族卤化物进行羰基化。 该工艺特别适用于从 6-溴-2-萘酚制备 6-羟基-2-萘酸，而 6-溴-2-萘酚很容易从β-萘酚制备，β-萘酚是一种容易获得且价格低廉的起始原料。
• Composition for forming a coating film for removing foreign matters
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US11319514B2

  公开（公告）日：2022-05-03

  A simplified method for removing foreign matters formed on a substrate in a semiconductor device manufacturing process; and a composition for forming a coating film for foreign matter removal use, which can be used in the method. A coating film is formed on a semiconductor substrate using a composition preferably containing a polyamic acid produced from (a) a tetracarboxylic dianhydride compound and (b) a diamine compound having at least one carboxyl group or a polyamic acid produced from (a) a tetracarboxylic dianhydride compound, (b) a diamine compound having at least one carboxyl group and (c) a diamine compound, and then foreign matters occurring on the coating film are removed together with the coating film by the treatment with a developing solution.

  一种用于清除半导体器件制造过程中在基片上形成的异物的简化方法；以及一种用于形成用于清除异物的涂膜的组合物，该组合物可用于该方法。使用一种组合物在半导体衬底上形成涂膜，该组合物最好含有由(a)四羧酸二酐化合物和(b)具有至少一个羧基的二胺化合物生成的聚酰胺酸，或由(a)四羧酸二酐化合物、(b)具有至少一个羧基的二胺化合物和(c)二胺化合物生成的聚酰胺酸，然后通过显影液的处理将涂膜上的异物连同涂膜一起去除。
• PRODUCTION OF 6-BROMO-2-NAPHTHOL AND DERIVATIVES
  申请人：ALBEMARLE CORPORATION

  公开号：EP0934240B1

  公开（公告）日：2001-01-10
• Underlayer coating forming composition containing dextrin ester compound
  申请人：Takei Satoshi

  公开号：US20070135581A1

  公开（公告）日：2007-06-14

  There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition for lithography comprising a dextrin ester compound that at least 50% of hydroxy groups in dextrin is converted into ester groups, a crosslinking compound, and an organic solvent.
• COMPOSITION FOR FORMING A COATING FILM FOR REMOVING FOREIGN MATTERS
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20200140792A1

  公开（公告）日：2020-05-07

  A simplified method for removing foreign matters formed on a substrate in a semiconductor device manufacturing process; and a composition for forming a coating film for foreign matter removal use, which can be used in the method. A coating film is formed on a semiconductor substrate using a composition preferably containing a polyamic acid produced from (a) a tetracarboxylic dianhydride compound and (b) a diamine compound having at least one carboxyl group or a polyamic acid produced from (a) a tetracarboxylic dianhydride compound, (b) a diamine compound having at least one carboxyl group and (c) a diamine compound, and then foreign matters occurring on the coating film are removed together with the coating film by the treatment with a developing solution.