A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing by exposure to actinic radiation is disclosed. Further, there is disclosed a method of preparing a surface-tack free photocured pattern structure using the photosensitive resin composition, which enables pattern structures improved with respect to surface tack-free characteristic to be obtained in a shortened period of time.
本发明公开了一种光敏
树脂组合物,该组合物在暴露于阳极辐射固化后,表面无粘着特性得到改善。此外,还公开了一种使用该光敏
树脂组合物制备表面无粘性光固化图案结构的方法,该方法可在较短时间内获得表面无粘性特性得到改善的图案结构。