First experimental evidence for the formation of a silicate anion by intramolecular addition of a persulfoxide to a trimethylsiloxy group
摘要:
The photooxidation of an alpha-trimethylsiloxysulfide has been studied. The reaction generates a persulfoxide which can be trapped by diphenylsulfoxide, decompose to generate triplet oxygen and substrate, or rearrange to a silicate product via a silicate intermediate. (C) 1998 Elsevier Science Ltd. All rights reserved.
Sassaman, Mark B.; Prakash, G.K.Surya; Olah, George A., Synthesis, 1990, # 2, p. 104 - 106
作者:Sassaman, Mark B.、Prakash, G.K.Surya、Olah, George A.
DOI:——
日期:——
First experimental evidence for the formation of a silicate anion by intramolecular addition of a persulfoxide to a trimethylsiloxy group
作者:Edward L. Clennan、David L. Dillon
DOI:10.1016/s0040-4039(98)01485-3
日期:1998.9
The photooxidation of an alpha-trimethylsiloxysulfide has been studied. The reaction generates a persulfoxide which can be trapped by diphenylsulfoxide, decompose to generate triplet oxygen and substrate, or rearrange to a silicate product via a silicate intermediate. (C) 1998 Elsevier Science Ltd. All rights reserved.