silicon(1+) monohydride | 31241-66-4

• 分子结构分类: 无机化合物 - 混合金属/非金属化合物 - 类金属有机物
• 英文名称: silicon(1+) monohydride
• CAS: 31241-66-4
• 化学式: HSi
• 分子量: 29.0934
• InChiKey: DNOWURJULUQXJY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.65
• 重原子数：
  1.0
• 可旋转键数：
  0.0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0.0
• 氢给体数：
  0.0
• 氢受体数：
  0.0

反应信息

• 作为反应物：
  描述：

  silicon(1+) monohydride 在 二氧化硫 作用下， 以 gaseous matrix 为溶剂， 生成 protonated silicon monoxide
  参考文献：
  名称：

  通过气相化学反应形成高能异构体HSiO +

  摘要：

  高能量异构体HSIO +质子化的SiO已经通过的SiH之间的快速O型原子转移反应产生的+和N 2在0.35乇○在氦气和氢气缓冲气体和HSIO的295±2 K.形成+由O-原子转移与基态SiOH +异构体的形成竞争，这在形式上是一种插入反应。SiH +与CO 2和SO 2的反应中还观察到其他插入反应。从顺序的O原子转移和HSiO +到SiOH +的异构化方面考虑，合理的插入机理在中间配合物中，当初始O原子转移中有足够的过量能量时，异构化可通过配合物中的质子穿梭或单分子实现。在实验的操作条件下，高能异构体HSiO +不会通过与H 2反应而转化为SiOH +。

  DOI：

  10.1016/0009-2614(91)80297-b
• 作为产物：
  描述：

  硅烷 在 氢气 作用下， 生成 silicon(1+) monohydride
  参考文献：
  名称：

  Detection of the fundamental band of SiH⁺(X ¹Σ⁺) in a silane plasma by diode laser spectroscopy

  摘要：

  DOI：

  10.1063/1.454479

文献信息

• Ion beam studies of the reaction of Si+(2P) with methane. Reaction mechanisms and thermochemistry of SiCHx+ (x = 1-3)
  作者：B. H. Boo、J. L. Elkind、Peter B. Armentrout

  DOI：10.1021/ja00162a007

  日期：1990.3

  of SiCHsub 3}sup +} or HSiCHsub 2}sup +}. Minor ionic products include SiCHsub 2}sup +}, CHsub 3}sup +}, and SiCHsup +}. The former product can be formed via the concomitant formation of molecular hydrogen or two hydrogen atoms. The latter process is much more efficient. All observed products are consistent with a reaction that occurs via an HSiCHsub 3}sup +} intermediate. From the measured

  引导离子束质谱法用于检查基态硅离子与甲烷的反应。所有产品的绝对横截面都是从近热到 14 eV 的相对动能测量的。仅观察到吸热过程，SiHsup +} 和 SiHsub 3}Csup +} 作为主要离子产物。有证据表明后一种物质有两种形式，Sisup +}-CHsub 3} 在低能量下形成和较高能量形式，可能是 SiCHsub 3}sup +} 或 HSiCH 的三重态子 2}sup +}。次要离子产物包括SiCHsub 2}sup +}、CHsub 3}sup +}和SiCHsup +}。前一种产物可以通过同时形成分子氢或两个氢原子而形成。后一个过程效率更高。所有观察到的产物都与通过 HSiCHsub 3}sup +} 中间体发生的反应一致。根据测量的反应阈值和其他信息，推导出以下硅物种的 298 K 形成热 (kcal/mol)：Delta}sub f}Hdegree}(SiH)
• Selected ion flow drift tube studies of the reactions of Si⁺(²P) with HCl, H₂O, H₂S, and NH₃: Reactions which produce atomic hydrogen
  作者：J. Glosík、P. Zakouřil、W. Lindinger

  DOI：10.1063/1.470375

  日期：1995.10.15

  The reaction rate coefficients, k, for the reactions of ground-state Si+(2P) with HCl, H2O, H2S, and NH3, have been measured as a function of reactant ion/reactant neutral center-of-mass kinetic energy, KECM, in a selected ion flow drift tube (SIFDT) apparatus, operated with helium at a temperature 298±2 K. The values k of the studied reactions have very pronounced, negative energy dependencies; the rate coefficients decrease by about 1 order of magnitude as KECM increase from near thermal values to ∼2 eV. The results are interpreted in terms of a simple model assuming the reactions to proceed via the formation of long-lived complexes. These intermediate complexes decompose back to reactants or forward to products, the unimolecular decomposition rate coefficients for these reactions being k1 and k2, respectively. It is found that a power law of the form k−1/k2=const(KECM)m closely describes each reaction.
• Boo; Armentrout, Journal of the American Chemical Society, 1991, vol. 113, # 18, p. 6401 - 6408
  作者：Boo、Armentrout

  DOI：——

  日期：——
• The SiH⁺(<i>A</i> ¹Π–<i>X</i> ¹Σ⁺) emission produced from the thermal energy reaction of He⁺ with SiH₄ under single collision conditions
  作者：Sumio Yamaguchi、Masaharu Tsuji、Hiroshi Obase、Hiroshi Sekiya、Yukio Nishimura

  DOI：10.1063/1.452666

  日期：1987.5

  A flowing afterglow reactor has been coupled to a low-pressure chamber for an optical spectroscopic study of the charge–transfer reaction of He+ with SiH4 at thermal energy. The SiH+(A 1Π–X 1Σ+) emission was observed in the 380–610 nm region. The nascent vibrational and rotational distributions of SiH+(A) have been determined. The vibrational distribution for 0≤v′≤3 was approximately exponential with an effective vibrational temperature of 820±60 K. The rotational temperature decreased from 600 K for v′=0 to 300 K for v′=3. These data indicated that only about 3% of the excess energy is released as internal energy of SiH+(A). From the emission rate constant, SiH+(A) represents about 25% of the total SiH+ ion in the He++SiH4 reaction.
• Formation of the high-energy isomer HSiO+ by chemical reaction in the gas phase
  作者：Arnold Fox、Diethard K. Bohme

  DOI：10.1016/0009-2614(91)80297-b

  日期：1991.12

  high-energy isomer HSiO+ of protonated SiO has been generated by a fast O-atom transfer reaction between SiH+ and N2O in helium and hydrogen buffer gases at 0.35 Torr and 295±2 K. Formation of HSiO+ by O-atom transfer proceeds in competition with formation of the ground-state SiOH+ isomer, which is formally an insertion reaction. Other insertion reactions were observed in the reactions of SiH+ with

  高能量异构体HSIO +质子化的SiO已经通过的SiH之间的快速O型原子转移反应产生的+和N 2在0.35乇○在氦气和氢气缓冲气体和HSIO的295±2 K.形成+由O-原子转移与基态SiOH +异构体的形成竞争，这在形式上是一种插入反应。SiH +与CO 2和SO 2的反应中还观察到其他插入反应。从顺序的O原子转移和HSiO +到SiOH +的异构化方面考虑，合理的插入机理在中间配合物中，当初始O原子转移中有足够的过量能量时，异构化可通过配合物中的质子穿梭或单分子实现。在实验的操作条件下，高能异构体HSiO +不会通过与H 2反应而转化为SiOH +。