Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R
1
a
Si(H)
b
X
4-a-b
and an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.
本发明涉及一种液体
化学品,用于在清洗具有表面细微不平整图案并且至少包含
硅不平整图案的晶圆时,在凹陷部分的表面上形成防
水保护膜。该液体
化学品包含一种由通式表示的
硅化合物A:R1aSi(H)bX4-a-b和一种酸A,其中酸A至少选择自甲基
三氟乙酸基
硅烷、甲基三
氟甲烷磺酸基
硅烷、二甲基
三氟乙酸基
硅烷、二甲基三
氟甲烷磺酸基
硅烷、丁基二甲基
硅烷三氟乙酸酯、丁基二甲基
硅烷三
氟甲烷磺酸酯、己基二甲基
硅烷三氟乙酸酯、己基二甲基
硅烷三
氟甲烷磺酸酯、辛基二甲基
硅烷三氟乙酸酯、辛基二甲基
硅烷三
氟甲烷磺酸酯、十基二甲基
硅烷三氟乙酸酯和十基二甲基
硅烷三
氟甲烷磺酸酯组成的群体中至少选取一种。