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1-Butylsulfanyl-4-methoxynaphthalene

中文名称
——
中文别名
——
英文名称
1-Butylsulfanyl-4-methoxynaphthalene
英文别名
1-butylsulfanyl-4-methoxynaphthalene
1-Butylsulfanyl-4-methoxynaphthalene化学式
CAS
——
化学式
C15H18OS
mdl
——
分子量
246.4
InChiKey
YCTNYYIJBFGXLP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.9
  • 重原子数:
    17
  • 可旋转键数:
    5
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.33
  • 拓扑面积:
    34.5
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    申请人:FUJIFILM CORPORATION
    公开号:US20150277225A1
    公开(公告)日:2015-10-01
    An actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (A) which generates acid by being irradiated with actinic rays or radiation where, when relative light absorbance is ε r using triphenyl sulfonium nonaphlate as a reference and relative quantum efficiency is φ r using triphenyl sulfonium nonaphlate as a reference, the relative light absorbance ε r is 0.4 to 0.8 and ε r ×φ r is 0.5 to 1.0.
  • [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT ACTINIQUE, FILM DE PHOTORÉSINE UTILISANT UNE TELLE COMPOSITION, PROCÉDÉ DE FORMATION DE MOTIFS, ET PROCÉDÉ POUR LA FABRICATION DE DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE, ET COMPOSÉ
    申请人:FUJIFILM CORP
    公开号:WO2014034533A1
    公开(公告)日:2014-03-06
    There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group, R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X- represents a non-nucleophilic anion.
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